Reference Wafer and Process for Manufacturing Same

A calibration reticle for use in constructing a calibration file for an archive media;

• the calibration reticle comprising a pattern exposed onto an archive media, wherein the pattern of the calibration reticle includes complementary alignment attributes, and the reticle is positioned such that the pattern of complementary alignment attributes overlay and interlock etched alignment attributes on the archive media, thereby forming interlocking rows and columns of completed alignment attributes between adjacent static calibration reticle exposure fields, wherein measurements of offsets in the completed alignment attributes are used to construct a calibration file for the archive media based upon the offset measurements and intrafield lens distortion data of a lens used to expose the pattern of complementary alignment attributes, and manufacturing error data for the calibration reticle.