G03F 9/7038
Alignment for proximity or contact printer
Official title: {Alignment for proximity or contact printer (proximity or contact printers per se G03F7/7035)}
G03F9/7038 (Alignment for proximity or contact printer) appears on 85 US grants and 89 published applications in this corpus.
Search patents in G03F- Granted patents
- 85
- Published applications
- 89
- Assignees
- 39
- Inventors
- 144
- Latest grant
- 1 Oct 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 3 |
| 2002 | 3 | 1 |
| 2003 | 6 | 2 |
| 2004 | 1 | 4 |
| 2005 | 1 | 1 |
| 2006 | 4 | 9 |
| 2007 | 4 | 12 |
| 2008 | 4 | 7 |
| 2009 | 6 | 7 |
| 2010 | 5 | 1 |
| 2011 | 5 | 4 |
| 2012 | 2 | 3 |
| 2013 | 0 | 7 |
| 2014 | 4 | 2 |
| 2015 | 3 | 8 |
| 2016 | 5 | 3 |
| 2017 | 6 | 4 |
| 2018 | 3 | 3 |
| 2019 | 4 | 3 |
| 2020 | 5 | 2 |
| 2021 | 5 | 1 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
| 2024 | 1 | 0 |
| 2025 | 0 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Pattern transfer sheet, method of monitoring pattern transfer printing, and pattern transfer printing system1 Oct 2024US 12,103,276 B2Wuhan DR Laser Technology Corp,. LTD
- Template, imprint apparatus, imprint method and imprint apparatus management method19 Oct 2021US 11,152,218 B2Toshiba Memory Corporation
- Information processing apparatus, storage medium, lithography apparatus, lithography system, and article manufacturing method13 Jul 2021US 11,061,335 B2Canon Kabushiki Kaisha
- Position detection apparatus, position detection method, imprint apparatus, and method of manufacturing article27 Apr 2021US 10,989,527 B2Canon Kabushiki Kaisha
- Low energy e-beam contact printing lithography16 Mar 2021US 10,950,441 B1
- Systems and processes for persistent marking of flexo plates with isolated microstructures and plates marked therewith4 Jun 2026US 2026/0151992 A1Esko-Graphics Imaging GmbH
- Pattern transfer sheet, method of monitoring pattern transfer printing, and pattern transfer printing system19 Jan 2023US 2023/0019668 A1Wuhan DR Laser Technology Corp,. LTD
- Low energy e-beam contact printing lithography4 Mar 2021US 2021/0066072 A1
- Proximity exposure method23 Jan 2020US 2020/0026192 A1V Technology Co., Ltd.
- Information processing apparatus, storage medium, lithography apparatus, lithography system, and article manufacturing method2 Jan 2020US 2020/0004158 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Compound objective lens having two focal points144US 5,446,565 AMatsushita Electric Industrial Co., Ltd. · 1995
- Position detecting system and device manufacturing method using the same64US 6,421,124 B1Canon Kabushiki Kaisha · 2002
- Optical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction52US 6,522,411 B1Massachusetts Institute of Technology · 2003
- Method of detecting positional displacement between mask and wafer, and exposure apparatus adopting the method41US 5,508,527 ACanon Kabushiki Kaisha · 1996
- Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof28US 6,628,392 B2Canon Kabushiki Kaisha · 2003