Information processing apparatus, storage medium, lithography apparatus, lithography system, and article manufacturing method

An information processing apparatus for acquiring an inspection condition for performing an inspection on a pattern formed by a lithography apparatus that forms a pattern on a substrate with an original, the information processing apparatus comprising:

• an acquisition unit configured to acquire a second inspection result acquired by performing an inspection on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to a model;
• and
• a determination unit configured to determine a second inspection condition to be applied in a case where an inspection is performed on the second pattern based on the second inspection result acquired by the acquisition unit,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and fourth information related to a first inspection result acquired by performing an inspection on the first pattern.

A lithography apparatus for forming a pattern on a substrate with an original, the lithography apparatus comprising:

• an information processing apparatus configured to acquire an inspection condition for performing an inspection on a pattern formed by the lithography apparatus that forms a pattern on a substrate with an original,
• wherein the information processing apparatus includes an acquisition unit configured to acquire a second inspection condition to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to a model,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern, and
• wherein a pattern is formed on the substrate to acquire the second inspection condition.

An article manufacturing method for manufacturing an article from a substrate on which processes are performed, the processes comprising:

• a first process of forming a pattern on a substrate by a lithography apparatus configured to form a pattern on a substrate with an original, the lithography apparatus comprising an information processing apparatus configured to acquire an inspection condition for performing an inspection on a pattern formed by the lithography apparatus configured to form a pattern on a substrate with an original, the information processing apparatus comprising an acquisition unit configured to acquire a second inspection condition to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to a model,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern, and
• wherein the lithography apparatus is configured to acquire the second inspection condition in the first process;
• and
• a second process of processing the substrate on which the pattern is formed in the first process.

A lithography system comprising:

• a lithography apparatus configured to form a pattern on a substrate with an original;
• and
• an information processing apparatus configured to acquire an inspection condition for performing an inspection on the pattern formed by the lithography apparatus,
• wherein the information processing apparatus comprises an acquisition unit configured to acquire a second inspection condition to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to a model,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern, and
• wherein in the lithography apparatus, a pattern is formed on the substrate, and the acquisition unit in the information processing apparatus acquires an inspection condition to be applied in a case where an inspection is performed on the pattern.

An article manufacturing method for manufacturing an article from a substrate on which processes are performed, the processes comprising:

• a first process of forming a pattern on a substrate by a lithography system configured to form a pattern on a substrate with an original, the lithography system comprising a lithography apparatus configured to form a pattern on a substrate with an original, and an information processing apparatus configured to acquire an inspection condition for performing an inspection on a pattern formed by the lithography apparatus, the information processing apparatus comprising an acquisition unit configured to acquire a second inspection condition to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to a model,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern,
• wherein the lithography system is configured to form a pattern on the substrate in the lithography apparatus, the acquisition unit in the information processing apparatus being configured to acquire an inspection condition to be applied in a case where an inspection is performed on the pattern;
• and
• a second process of processing the substrate on which the pattern is formed in the first process.