Information processing apparatus, storage medium, lithography apparatus, lithography system, and article manufacturing method

An information processing apparatus for acquiring an inspection condition for performing an inspection on a pattern formed by a lithography apparatus that forms a pattern on a substrate with an original, the information processing apparatus comprising:

• an acquisition unit configured to acquire a second inspection result, output from a model, of an inspection on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to the model;
• and
• a determination unit configured to determine a second inspection condition to be applied in a case where an inspection is performed on the second pattern based on the second inspection result acquired by the acquisition unit,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and fourth information related to a first inspection result acquired by performing an inspection on the first pattern,
• wherein the model outputs the second inspection result of the inspection on the second pattern by inputting the third information indicating the state of the lithography apparatus acquired when the second pattern is formed.

A lithography apparatus for forming a pattern on a substrate with an original, the lithography apparatus comprising:

• an information processing apparatus configured to acquire an inspection condition for performing an inspection on a pattern formed by the lithography apparatus that forms a pattern on a substrate with an original,
• wherein the information processing apparatus includes an acquisition unit configured to acquire a second inspection condition output from a model to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to the model,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern, and
• wherein a pattern is formed on the substrate to acquire the second inspection condition,
• wherein the model outputs information indicating the second inspection condition to be applied in the case where the inspection is performed on the second pattern by inputting the third information indicating the state of the lithography apparatus acquired when the second pattern is formed.

An article manufacturing method for manufacturing an article from a substrate on which processes are performed, the processes comprising:

• a first process of forming a pattern on a substrate by a lithography apparatus configured to form a pattern on a substrate with an original, the lithography apparatus comprising an information processing apparatus configured to acquire an inspection condition for performing an inspection on a pattern formed by the lithography apparatus configured to form a pattern on a substrate with an original, the information processing apparatus comprising an acquisition unit configured to acquire a second inspection condition output from a model to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to the model,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern, and
• wherein the lithography apparatus is configured to acquire the second inspection condition in the first process;
• and
• a second process of processing the substrate on which the pattern is formed in the first process,
• wherein the model outputs information indicating the second inspection condition to be applied in the case where the inspection is performed on the second pattern by inputting the third information indicating the state of the lithography apparatus acquired when the second pattern is formed.

A lithography system comprising:

• a lithography apparatus configured to form a pattern on a substrate with an original;
• and
• an information processing apparatus configured to acquire an inspection condition for performing an inspection on the pattern formed by the lithography apparatus,
• wherein the information processing apparatus comprises an acquisition unit configured to acquire a second inspection condition output from a model to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to the model,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern, and
• wherein in the lithography apparatus, a pattern is formed on the substrate, and the acquisition unit in the information processing apparatus acquires an inspection condition to be applied in a case where an inspection is performed on the pattern,
• wherein the model outputs information indicating the second inspection condition to be applied in the case where the inspection is performed on the second pattern by inputting the third information indicating the state of the lithography apparatus acquired when the second pattern is formed.

An article manufacturing method for manufacturing an article from a substrate on which processes are performed, the processes comprising:

• a first process of forming a pattern on a substrate by a lithography system configured to form a pattern on a substrate with an original, the lithography system comprising a lithography apparatus configured to form a pattern on a substrate with an original, and an information processing apparatus configured to acquire an inspection condition for performing an inspection on a pattern formed by the lithography apparatus, the information processing apparatus comprising an acquisition unit configured to acquire a second inspection condition output from a model to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to the model,
• wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern,
• wherein the lithography system is configured to form a pattern on the substrate in the lithography apparatus, the acquisition unit in the information processing apparatus being configured to acquire an inspection condition to be applied in a case where an inspection is performed on the pattern;
• and
• a second process of processing the substrate on which the pattern is formed in the first process,
• wherein the model outputs information indicating the second inspection condition to be applied in the case where the inspection is performed on the second pattern by inputting the third information indicating the state of the lithography apparatus acquired when the second pattern is formed.