Position detection apparatus, position detection method, imprint apparatus, and method of manufacturing article

A position detection method comprising:

• detecting moire caused by overlap between a first diffraction grating including a plurality of patterns arrayed and a second diffraction grating including a plurality of patterns arrayed;
• and
• obtaining a relative position of the first diffraction grating and the second diffraction grating based on the moire,
• wherein a pitch of the plurality of patterns of the first diffraction grating is constant and a pitch of the plurality of patterns of the second diffraction grating is constant,
• wherein the pitch of the plurality of patterns of the first diffraction grating and the pitch of the plurality of patterns of the second diffraction grating are different from each other, and
• wherein an interval between a pattern at an end portion and a pattern adjacent to the pattern at the end portion of the plurality of patterns of the first diffraction grating is wider than an interval between adjacent patterns of remaining patterns of the plurality of patterns of the first diffraction grating, or
• wherein the interval between the pattern at the end portion and the pattern adjacent to the pattern at the end portion of the plurality of patterns of the first diffraction grating is wider than the interval between the adjacent patterns of remaining patterns of the plurality of patterns of the first diffraction grating and an interval between a pattern at an end portion and a pattern adjacent to the pattern at the end portion of the plurality of patterns of the second diffraction grating is wider than an interval between adjacent patterns of remaining patterns of the plurality of patterns of the second diffraction grating.

A position detection method comprising:

• detecting moire caused by overlap between a first diffraction grating in which a plurality of patterns is arrayed and a second diffraction grating in which a plurality of patterns is arrayed;
• and
• obtaining a relative position of the first diffraction grating and the second diffraction grating based on the moire,
• wherein a pitch of the plurality of patterns of the first diffraction grating is constant and a pitch of the plurality of patterns of the second diffraction grating is constant,
• wherein the pitch of the plurality of patterns of the first diffraction grating and the pitch of the plurality of patterns of the second diffraction grating are different from each other,
• wherein the first diffraction grating includes a peripheral region that includes at least one pattern including a pattern at an end portion of the plurality of patterns of the first diffraction grating, and a central region that includes remaining patterns of the plurality of patterns of the first diffraction grating, and
• wherein a width of each of all patterns in the peripheral region of the first diffraction grating is smaller than a width of each of the remaining patterns in the central region of the first diffraction grating.

A position detection method comprising:

• detecting moire caused by overlap between a first diffraction grating in which a plurality of patterns is arrayed and a second diffraction grating in which a plurality of patterns is arrayed;
• and
• obtaining a relative position of the first diffraction grating and the second diffraction grating based on the moire,
• wherein a pitch of the plurality of patterns of the first diffraction grating is constant and a pitch of the plurality of patterns of the second diffraction grating is constant,
• wherein the pitch of the plurality of patterns of the first diffraction grating and the pitch of the plurality of patterns of the second diffraction grating are different from each other,
• wherein the first diffraction grating includes a peripheral region that includes at least two patterns including a pattern at an end portion of the plurality of patterns of the first diffraction grating, and a central region that includes remaining patterns of the plurality of patterns of the first diffraction grating, and
• wherein an interval between adjacent patterns of all patterns in the peripheral region of the first diffraction grating is wider than each interval between adjacent patterns of the remaining patterns in the central region of the first diffraction grating.

A position detection method comprising:

• detecting moire caused by overlap between a first diffraction grating in which a plurality of patterns is arrayed and a second diffraction grating in which a plurality of patterns is arrayed;
• and
• obtaining a relative position of the first diffraction grating and the second diffraction grating based on the moire,
• wherein a pitch of the plurality of patterns of the first diffraction grating is constant and a pitch of the plurality of patterns of the second diffraction grating is constant,
• wherein the pitch of the plurality of patterns of the first diffraction grating and the pitch of the plurality of patterns of the second diffraction grating are different from each other, and
• wherein a width of a first pattern as a pattern at an end portion, each of widths of the first pattern and a second pattern adjacent to the first pattern, or each of widths of the first pattern, the second pattern, and a third pattern adjacent to the second pattern, of the plurality of patterns of the first diffraction grating is smaller than widths of remaining patterns of the plurality of patterns of the first diffraction grating.

A position detection method comprising:

• detecting moire caused by overlap between a first diffraction grating in which a plurality of patterns is arrayed and a second diffraction grating in which a plurality of patterns is arrayed;
• and
• obtaining a relative position of the first diffraction grating and the second diffraction grating based on the moire,
• wherein a pitch of the plurality of patterns of the first diffraction grating is constant and a pitch of the plurality of patterns of the second diffraction grating is constant,
• wherein the pitch of the plurality of patterns of the first diffraction grating and the pitch of the plurality of patterns of the second diffraction grating are different from each other, and
• wherein a first interval between a first pattern as a pattern at an end portion and a second pattern adjacent to the first pattern, each of the first interval and a second interval between the second pattern and a third pattern adjacent to the second pattern, or each of the first interval, the second interval, and a third interval between the third pattern and a fourth pattern adjacent to the third pattern, of the plurality of patterns of the first diffraction grating is wider than an interval between adjacent patterns of remaining patterns of the plurality of patterns of the first diffraction grating.