Position detecting system and device manufacturing method using the same

A method of producing relative positional information related to first and second objects, said method comprising the steps of:

• projecting light toward the first and second objects, which are disposed opposed to each other and have physical optic elements, said light projecting step including a step of selecting one of different wavelengths and a step of projecting light of the one wavelength, for position detection;
• detecting light emitted in said light projecting step and being influenced by both of the physical optic elements of the first and second objects, wherein relative positional information related to the first and second objects is produced on the basis of the detection in said light detecting step;
• and
• changing the spacing between the first and second objects in accordance with the selected wavelength of light projected in said light projecting step.

An apparatus for transferring, by exposure, a pattern of a mask onto a workpiece, said apparatus comprising:

• light projecting means for projecting light toward the mask and the workpiece, which are disposed opposed to each other and have physical optic elements, said light projecting means having selecting means for selecting one of different wavelengths and for projecting light of the one wavelength, for position detection;
• light detecting means for detecting light emitted from said light projecting means and being influenced by both of the physical optic elements of the mask and the workpiece;
• spacing setting means for changing the spacing between the mask and the workpiece in accordance with the selected wavelength of light projected by said light projecting means;
• and
• an alignment system for aligning the mask and the workpiece with each other on the basis of the detection by said light detecting means, wherein the pattern of the mask is transferred to the workpiece thus aligned.

A device manufacturing method, comprising the steps of:

• projecting light toward a mask and a workpiece, which are disposed opposed to each other and have physical optic elements, said light projection step including a step of selecting one of different wavelengths and a step of projecting light of the one wavelength, for position detection;
• detecting light emitted in said light projecting step and being influenced by both of the physical optic elements of the mask and the workpiece;
• changing the spacing between the mask and the workpiece in accordance with the selected wavelength of light projected in said light detecting step;
• aligning the mask and the workpiece on the basis of the detection in said detecting step;
• transferring, by exposure, a pattern of the mask onto the workpiece thus aligned;
• and
• performing a developing process to the exposed workpiece, whereby a device can be produced from the developed workpiece.

A system for producing relative positional information related to first and second objects, said system comprising:

• light projecting means for projecting light toward the first and second objects, which are disposed opposed to each other and have physical optic elements, said light projecting means being capable of projecting lights of different wavelengths;
• light detecting means for detecting light emitted from said light projecting means and being influenced by both of the physical optic elements of the first and second objects, wherein relative positional information related to the first and second objects is produced on the basis of the detection by said light detecting means;
• spacing setting means for changing the spacing between the first and second objects in accordance with a wavelength of light projected by said light projecting means;
• and
• selecting means for selecting a wavelength to be used, on the basis of a comparison made to light intensity distributions with respect to the different wavelengths, detected by said light detecting means.

A system for producing relative positional information related to first and second objects, said system comprising:

• light projecting means for projecting light toward the first and second objects, which are disposed opposed to each other and have physical optic elements, said light projecting means being capable of projecting lights of different wavelengths and projecting the lights of different wavelengths with different angles;
• light detecting means for detecting light emitted from said light projecting means and being influenced by both of the physical optic elements of the first and second objects, wherein relative positional information related to the first and second objects is produced on the basis of the detection by said light detecting means;
• and
• spacing setting means for changing the spacing between the first and second objects in accordance with a wavelength of light to be projected by said light projecting means.

A method of producing relative positional information related to first and second objects, said method comprising the steps of:

• projecting light toward the first and second objects, which are disposed opposed to each other and have physical optic elements, said light projecting step being capable of projecting lights of different wavelengths;
• detecting light emitted in said light projecting step and being influenced by both of the physical optic elements of the first and second objects, wherein relative positional information related to the first and second objects is produced on the basis of the detection in said light detecting step;
• changing the spacing between the first and second objects in accordance with a wavelength of light projected in said light projecting step;
• and
• selecting a wavelength to be used, on the basis of a comparison made to light intensity distributions with respect to the different wavelengths detected in said light detecting step.

An apparatus for transferring, by exposure, a pattern of a mask onto a workpiece, said apparatus comprising:

• light projecting means for projecting light toward the mask and the workpiece, which are disposed opposed to each other and have physical optic elements, said light projecting means being capable of projecting lights of different wavelengths;
• light detecting means for detecting light emitted from said light projecting means and being influenced by both of the physical optic elements of the mask and the workpiece;
• spacing setting means for changing the spacing between the mask and the workpiece in accordance with a wavelength of light to be projected by said light projecting means;
• an alignment system for aligning the mask and the workpiece with each other on the basis of the detection by said light detecting means, wherein the pattern of the mask is transferred to the workpiece thus aligned;
• and
• selecting means for selecting a wavelength to be used, on the basis of a comparison made to light intensity distributions with respect to the different wavelengths, detected by said light detecting means.

An apparatus for transferring, by exposure, a pattern of a mask onto a workpiece, said apparatus comprising:

• light projecting means for projecting light toward the mask and the workpiece, which are disposed opposed to each other and have physical optic elements, said light projecting means being capable of projecting lights of different wavelengths, and projecting the lights of different wavelengths with different angles;
• light detecting means for detecting light emitted from said light projecting means and being influenced by both of the physical optic elements of the mask and the workpiece;
• spacing setting means for changing the spacing between the mask and the workpiece in accordance with a wavelength of light to be projected by said light projecting means;
• and
• an alignment system for aligning the mask and the workpiece with each other on the basis of the detection by said light detecting means, wherein the pattern of the mask is transferred to the workpiece thus aligned.