G03F 9/7046
Strategy
Official title: {Strategy, e.g. mark, sensor or wavelength selection}
G03F9/7046 (Strategy) appears on 414 US grants and 449 published applications in this corpus.
Search patents in G03F- Granted patents
- 414
- Published applications
- 449
- Assignees
- 82
- Inventors
- 768
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 4 | 0 |
| 1999 | 5 | 0 |
| 2000 | 3 | 0 |
| 2001 | 6 | 3 |
| 2002 | 16 | 9 |
| 2003 | 9 | 14 |
| 2004 | 6 | 18 |
| 2005 | 15 | 9 |
| 2006 | 8 | 24 |
| 2007 | 12 | 14 |
| 2008 | 12 | 16 |
| 2009 | 10 | 9 |
| 2010 | 11 | 14 |
| 2011 | 8 | 8 |
| 2012 | 8 | 9 |
| 2013 | 11 | 7 |
| 2014 | 9 | 7 |
| 2015 | 12 | 21 |
| 2016 | 18 | 14 |
| 2017 | 15 | 18 |
| 2018 | 22 | 29 |
| 2019 | 33 | 31 |
| 2020 | 24 | 20 |
| 2021 | 21 | 26 |
| 2022 | 24 | 32 |
| 2023 | 20 | 32 |
| 2024 | 20 | 31 |
| 2025 | 25 | 15 |
| 2026 | 20 | 19 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of spatially aligning a patterning device and a substrate22 Sep 2026US 12,743,035 B2ASML Netherlands B. V.
- Managing multi-objective alignments for imprinting25 Aug 2026US 12,715,171 B2Magic Leap, Inc.
- Measurement apparatus, measurement method, lithography apparatus and article manufacturing method18 Aug 2026US 12,710,263 B2Canon Kabushiki Kaisha
- Overlay mark, overlay error measurement method for wafer, and wafer stacking method18 Aug 2026US 12,710,697 B2Wuhan Xinxin Semiconductor Manufacturing Co., Ltd.
- Multiple targets on substrate layers for layer alignment21 Jul 2026US 12,687,793 B2Intel Corporation
- Method and system for creating a stitched design file17 Sep 2026US 2026/0277113 A1APPLIED Materials.Inc.
- Alignment apparatus, lithography apparatus, and article manufacturing method17 Sep 2026US 2026/0277125 A1Canon Kabushiki Kaisha
- Substrate processing system and substrate processing method, and device manufacturing method20 Aug 2026US 2026/0244120 A1Nikon Corporation
- A method for modeling metrology data over a substrate area and associated apparatuses20 Aug 2026US 2026/0244188 A1ASML Netherlands B. V.
- A method for modeling measurement data over a substrate area and associated apparatuses20 Aug 2026US 2026/0244826 A1ASML Netherlands B. V.
Most cited
By later US patents
- Latent-image control of lithography tools176US 5,124,927 AInternational Business Machines Corporation · 1992
- Alignment method and method for producing device using the alignment method89US 6,481,003 B1Nikon Corporation · 2002
- Method for correcting alignment, method for manufacturing a semiconductor device and a semiconductor device61US 6,177,330 B1Mitsubishi Denki Kabushiki Kaisha · 2001
- Method and apparatus for selecting wafer alignment marks based on film thickness variation54US 6,383,888 B1Advanced Micro Devices, Inc. · 2002
- Semiconductor device manufacturing system47US 5,249,016 ACanon Kabushiki Kaisha · 1993