A method for modeling measurement data over a substrate area and associated apparatuses
AssigneeASML Netherlands B.V.
InventorsMayank MAYANK, Edo Maria HULSEBOS, Joost ROOZE
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Abstract
A method for modeling measurement data over a substrate area and associated apparatus. The method including obtaining substrate measurement data describing spatial variation of a substrate parameter; and fitting a model to the substrate measurement data to obtain a fitted model, wherein the fitting includes regularizing the fitting using a plurality of regularization parameters, the plurality of regularization parameters having been individually optimized to penalize spatial components of the substrate measurement data in accordance with their effect on a parameter of interest.
Claims21
A method for modeling substrate measurement data relating to a substrate in a lithographic process, the method comprising:
- obtaining substrate measurement data describing spatial variation of a substrate parameter;
- and
- fitting, by a hardware computer, a computer model to the substrate measurement data to obtain a fitted model, wherein the fitting step comprises regularizing the fitting using a plurality of regularization parameters, the plurality of regularization parameters having been individually optimized to penalize spatial components of the substrate measurement data in accordance with their effect on a parameter of interest.
(canceled)
A non-transitory computer-readable medium comprising instructions therein, the instructions, when run on an apparatus, are configured to cause the apparatus to at least:
- obtain substrate measurement data relating to a substrate in a lithographic process describing spatial variation of a substrate parameter;
- and
- fit a computer model to the substrate measurement data to obtain a fitted model by at least regularization of the fit using a plurality of regularization parameters, the plurality of regularization parameters having been individually optimized to penalize spatial components of the substrate measurement data in accordance with their effect on a parameter of interest.
Dependencies are inferred from the claim text.