G03F 9/7023
Aligning or positioning in direction perpendicular to substrate surface
Official title: {Aligning or positioning in direction perpendicular to substrate surface}
G03F9/7023 (Aligning or positioning in direction perpendicular to substrate surface) appears on 960 US grants and 810 published applications in this corpus.
Search patents in G03F- Granted patents
- 960
- Published applications
- 810
- Assignees
- 200
- Inventors
- 1,602
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 4 | 0 |
| 1983 | 3 | 0 |
| 1984 | 8 | 0 |
| 1985 | 13 | 0 |
| 1986 | 25 | 0 |
| 1987 | 21 | 0 |
| 1988 | 8 | 0 |
| 1989 | 16 | 0 |
| 1990 | 7 | 0 |
| 1991 | 9 | 0 |
| 1992 | 19 | 0 |
| 1993 | 11 | 0 |
| 1994 | 13 | 0 |
| 1995 | 11 | 0 |
| 1996 | 7 | 0 |
| 1997 | 17 | 0 |
| 1998 | 11 | 0 |
| 1999 | 13 | 0 |
| 2000 | 20 | 0 |
| 2001 | 21 | 12 |
| 2002 | 26 | 31 |
| 2003 | 32 | 28 |
| 2004 | 23 | 33 |
| 2005 | 27 | 41 |
| 2006 | 38 | 53 |
| 2007 | 30 | 49 |
| 2008 | 28 | 31 |
| 2009 | 24 | 53 |
| 2010 | 38 | 33 |
| 2011 | 23 | 30 |
| 2012 | 25 | 16 |
| 2013 | 36 | 30 |
| 2014 | 29 | 31 |
| 2015 | 21 | 27 |
| 2016 | 30 | 25 |
| 2017 | 27 | 25 |
| 2018 | 27 | 30 |
| 2019 | 45 | 48 |
| 2020 | 33 | 40 |
| 2021 | 45 | 26 |
| 2022 | 30 | 24 |
| 2023 | 23 | 27 |
| 2024 | 14 | 27 |
| 2025 | 18 | 20 |
| 2026 | 11 | 20 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus22 Sep 2026US 12,743,034 B2ASML Netherlands B. V.
- Gap detection system and method, and focal plane correction method4 Aug 2026US 12,699,332 B2The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Imprint apparatus, imprint method, and article manufacturing method16 Jun 2026US 12,654,387 B2Canon Kabushiki Kaisha
- Measurement apparatus5 May 2026US 12,618,667 B2ASML Netherlands B. V.
- Multibeam 3-D focus generator5 May 2026US 12,619,090 B2Carl Zeiss SMT GmbH
- Method for improving the prediction of a current focus starting point in a semiconductor technology apparatus17 Sep 2026US 2026/0277123 A1
- Lithography process monitoring method17 Sep 2026US 2026/0277124 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Positioning system and method of forming the same3 Sep 2026US 2026/0259510 A1Agency for Science, Technology and Research
- Positioning apparatus, exposure apparatus, air sensor, and article manufacturing method27 Aug 2026US 2026/0251988 A1Canon Kabushiki Kaisha
- Method of determining stressors applied to a substrate20 Aug 2026US 2026/0244119 A1ASML Netherlands B. V.
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Projection exposure apparatus and method605US 6,122,036 ANikon Corporation · 2000
- Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement549US 6,208,407 B1ASM Lithography B. V. · 2001
- Exposure apparatus and method548US 6,341,007 B12002