Back to results
US 2026/0277123 A1Published application
Method for improving the prediction of a current focus starting point in a semiconductor technology apparatus
OwnerAsad Rasool, Susanne Toepfer +2inventors
InventorsAsad Rasool, Susanne Toepfer, Klaus Gwosch, Ulrich Matejka
Life of this patent
Estimating the term…
Abstract
Disclosed is a method for predicting a best focus for focusing at a current measurement location of at least one section of an object in a semiconductor technology apparatus and is distinguished by the fact that the current best focus is determined at least on the basis of focus starting point information from at least one previous measurement location in the vicinity of the current measurement location.
Claims28
A method for predicting a best focus for focusing at a current measurement location of at least one section of an object in a semiconductor technology apparatus,
- characterized in that
- a current predicted best focus is determined at least on the basis of focus information from at least one previous measurement location in the vicinity of the current measurement location (.
Dependencies are inferred from the claim text.