G03F 9/7034
Leveling
Official title: {Leveling}
G03F9/7034 (Leveling) appears on 319 US grants and 344 published applications in this corpus.
Search patents in G03F- Granted patents
- 319
- Published applications
- 344
- Assignees
- 64
- Inventors
- 656
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 4 | 0 |
| 2001 | 11 | 5 |
| 2002 | 8 | 10 |
| 2003 | 11 | 11 |
| 2004 | 10 | 18 |
| 2005 | 16 | 26 |
| 2006 | 22 | 27 |
| 2007 | 15 | 17 |
| 2008 | 14 | 12 |
| 2009 | 11 | 28 |
| 2010 | 14 | 16 |
| 2011 | 10 | 10 |
| 2012 | 13 | 5 |
| 2013 | 16 | 12 |
| 2014 | 10 | 11 |
| 2015 | 12 | 8 |
| 2016 | 9 | 7 |
| 2017 | 6 | 9 |
| 2018 | 6 | 14 |
| 2019 | 20 | 21 |
| 2020 | 14 | 15 |
| 2021 | 16 | 8 |
| 2022 | 11 | 9 |
| 2023 | 6 | 8 |
| 2024 | 7 | 18 |
| 2025 | 9 | 8 |
| 2026 | 6 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Measurement apparatus5 May 2026US 12,618,667 B2ASML Netherlands B. V.
- Projection unit for a level sensor, method of monitoring height of a substrate, and lithographic system comprising the projection unit5 May 2026US 12,619,170 B2ASML Netherlands B. V.
- Leveling system for cantilever calibration28 Apr 2026US 12,613,475 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Overlay correction method, and exposure method and semiconductor device manufacturing method including overlay correction method24 Mar 2026US 12,585,199 B2Samsung Electronics Co., Ltd.
- System and method for generating level data for a surface of a substrate27 Jan 2026US 12,535,314 B2ASML Netherlands B. V.
- Positioning system and method of forming the same3 Sep 2026US 2026/0259510 A1Agency for Science, Technology and Research
- Method of determining stressors applied to a substrate20 Aug 2026US 2026/0244119 A1ASML Netherlands B. V.
- Height measurement error determination13 Aug 2026US 2026/0235397 A1ASML Netherlands B. V.
- Measurement device, method of measurement, and method of manufacturing devices6 Aug 2026US 2026/0227709 A1ASML Netherlands B. V.
- Method and apparatus for measuring a topography of a surface of an object30 Jul 2026US 2026/0219592 A1ASML Netherlands B. V.
Most cited
By later US patents
- Projection exposure apparatus and method605US 6,122,036 ANikon Corporation · 2000
- Lithographic apparatus and device manufacturing method with substrate measurement not through liquid168US 7,193,232 B2ASML Netherlands B. V. · 2007
- Imaging apparatus having a focus-error and/or tilt detection device117US 5,191,200 AU. S. Philips Corporation · 1993
- Horizontal position detecting device114US 4,558,949 ANippon Kogaku K. K. · 1985
- Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness106US 7,333,174 B2ASML Netherlands B. V. · 2008