G03F 9/703
Gap setting
Official title: {Gap setting, e.g. in proximity printer}
G03F9/703 (Gap setting) appears on 73 US grants and 66 published applications in this corpus.
Search patents in G03F- Granted patents
- 73
- Published applications
- 66
- Assignees
- 42
- Inventors
- 141
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 1 |
| 2002 | 2 | 0 |
| 2003 | 3 | 4 |
| 2004 | 3 | 5 |
| 2005 | 1 | 1 |
| 2006 | 5 | 8 |
| 2007 | 4 | 10 |
| 2008 | 5 | 1 |
| 2009 | 0 | 5 |
| 2010 | 7 | 4 |
| 2011 | 2 | 1 |
| 2012 | 4 | 3 |
| 2013 | 1 | 2 |
| 2014 | 3 | 3 |
| 2015 | 0 | 1 |
| 2016 | 1 | 3 |
| 2017 | 5 | 2 |
| 2018 | 4 | 1 |
| 2019 | 3 | 5 |
| 2020 | 4 | 1 |
| 2021 | 3 | 2 |
| 2022 | 0 | 1 |
| 2023 | 1 | 0 |
| 2024 | 0 | 0 |
| 2025 | 0 | 1 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Gap detection system and method, and focal plane correction method4 Aug 2026US 12,699,332 B2The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Anti-slippery stamp landing ring31 Jan 2023US 11,567,417 B2APPLIED Materials.Inc.
- Imprint apparatus, imprint method, and article manufacturing method30 Nov 2021US 11,187,979 B2Canon Kabushiki Kaisha
- Method in which alignment control of a member and a substrate is effected with respect to an in-plane direction of the substrate and an uncured material in a state of bringing a member and the uncured material on a substrate into contact27 Apr 2021US 10,990,005 B2Canon Kabushiki Kaisha
- Low energy e-beam contact printing lithography16 Mar 2021US 10,950,441 B1
- Gap detection system and method, and focal plane correction method30 Apr 2026US 2026/0118783 A1The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Deposition apparatus, mask for deposition apparatus, and method of measuring gap between mask for deposition apparatus and substrate26 Jun 2025US 2025/0207911 A1Samsung Display Co., Ltd.
- Anti-slippery stamp landing ring21 Jul 2022US 2022/0229370 A1APPLIED Materials.Inc.
- Apparatus for processing a substrate, system for processing a substrate, and methods therefor4 Nov 2021US 2021/0340663 A1APPLIED Materials.Inc.
- Low energy e-beam contact printing lithography4 Mar 2021US 2021/0066072 A1
Most cited
By later US patents
- Method and apparatus for aligning mask and wafer members89US 4,326,805 ABell Telephone Laboratories, Incorporated · 1982
- Exposure process and system84US 4,475,223 AHitachi, Ltd. · 1984
- Position detecting system and device manufacturing method using the same64US 6,421,124 B1Canon Kabushiki Kaisha · 2002
- Optical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction52US 6,522,411 B1Massachusetts Institute of Technology · 2003
- Method and apparatus for setting the gap distance between a mask and a wafer at a predetermined distance51US 5,179,863 AKabushiki Kaisha Toshiba · 1993