Anti-slippery stamp landing ring
AssigneeApplied Materials, Inc.
InventorsJing Jiang, Suraj Yadav, Amita Joshi, Vivian Hsu
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Abstract
Apparatus and methods of performing nanoimprint lithography using an anti-slip landing ring are provided. In one embodiment, a process chamber for nanoimprint lithography is provided and includes a substrate support and a ring disposed on the substrate support. The ring has a top surface opposite the substrate support, and the top surface has a grid pattern. A bottom surface facing the substrate support has a different pattern compared to the grid pattern.
Claims20
A process chamber for nanoimprint lithography, comprising:
- a substrate support;
- and
- a ring disposed on the substrate support, the ring having a top surface opposite the substrate support and a bottom surface opposite the top surface, and wherein the top surface has a grid pattern, and the bottom surface has a different pattern than the top surface.
A process chamber for nanoimprint lithography, comprising:
- a substrate support;
- and
- a ring disposed on the substrate support, the ring having a top surface opposite the substrate support and a bottom surface opposite the top surface, and wherein the top surface has a pattern of pointed features and the bottom surface has a different pattern than the top surface.
A process chamber for nanoim print lithography, comprising:
- a substrate support;
- and
- a ring disposed on the substrate support, the ring having a top surface opposite the substrate support and a bottom surface opposite the top surface, and wherein the top surface has an adhesive coating disposed thereon and the bottom surface is uncoated with the adhesive.
Dependencies are inferred from the claim text.