G03F 9/7026
Focusing
Official title: {Focusing}
G03F9/7026 (Focusing) appears on 613 US grants and 514 published applications in this corpus.
Search patents in G03F- Granted patents
- 613
- Published applications
- 514
- Assignees
- 125
- Inventors
- 971
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 3 | 0 |
| 1983 | 2 | 0 |
| 1984 | 5 | 0 |
| 1985 | 7 | 0 |
| 1986 | 14 | 0 |
| 1987 | 10 | 0 |
| 1988 | 5 | 0 |
| 1989 | 6 | 0 |
| 1990 | 2 | 0 |
| 1991 | 3 | 0 |
| 1992 | 10 | 0 |
| 1993 | 5 | 0 |
| 1994 | 7 | 0 |
| 1995 | 6 | 0 |
| 1996 | 7 | 0 |
| 1997 | 15 | 0 |
| 1998 | 11 | 0 |
| 1999 | 13 | 0 |
| 2000 | 15 | 0 |
| 2001 | 14 | 7 |
| 2002 | 22 | 27 |
| 2003 | 23 | 19 |
| 2004 | 15 | 21 |
| 2005 | 17 | 24 |
| 2006 | 24 | 28 |
| 2007 | 17 | 26 |
| 2008 | 16 | 24 |
| 2009 | 17 | 36 |
| 2010 | 17 | 17 |
| 2011 | 18 | 20 |
| 2012 | 16 | 8 |
| 2013 | 22 | 16 |
| 2014 | 19 | 22 |
| 2015 | 14 | 24 |
| 2016 | 21 | 15 |
| 2017 | 18 | 20 |
| 2018 | 20 | 19 |
| 2019 | 35 | 29 |
| 2020 | 19 | 29 |
| 2021 | 28 | 17 |
| 2022 | 20 | 15 |
| 2023 | 17 | 17 |
| 2024 | 6 | 11 |
| 2025 | 8 | 9 |
| 2026 | 4 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus22 Sep 2026US 12,743,034 B2ASML Netherlands B. V.
- Multibeam 3-D focus generator5 May 2026US 12,619,090 B2Carl Zeiss SMT GmbH
- System and method for generating level data for a surface of a substrate27 Jan 2026US 12,535,314 B2ASML Netherlands B. V.
- Exposure method and exposure apparatus13 Jan 2026US 12,523,942 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Exposing apparatus and method for manufacturing article2 Dec 2025US 12,487,529 B2Canon Kabushiki Kaisha
- Method for improving the prediction of a current focus starting point in a semiconductor technology apparatus17 Sep 2026US 2026/0277123 A1
- Lithography process monitoring method17 Sep 2026US 2026/0277124 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Positioning apparatus, exposure apparatus, air sensor, and article manufacturing method27 Aug 2026US 2026/0251988 A1Canon Kabushiki Kaisha
- Height measurement error determination13 Aug 2026US 2026/0235397 A1ASML Netherlands B. V.
- Method of focus metrology13 Aug 2026US 2026/0237052 A1ASML Netherlands B. V.
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement549US 6,208,407 B1ASM Lithography B. V. · 2001
- Exposure apparatus and method548US 6,341,007 B12002
- Exposure apparatus and method473US 6,590,634 B1Nikon Corporation · 2003