G03F 2009/005
Registration or positioning of originals, masks, frames, photographic sheets or textured or
Official title: {for microlithography}
G03F2009/005 (Registration or positioning of originals, masks, frames, photographic sheets or textured or) appears on 15 US grants and 16 published applications in this corpus.
Search patents in G03F- Granted patents
- 15
- Published applications
- 16
- Assignees
- 7
- Inventors
- 30
- Latest grant
- 8 Dec 2020
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|---|---|---|
| 2008 | 0 | 1 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 1 | 0 |
| 2012 | 0 | 1 |
| 2013 | 0 | 0 |
| 2014 | 1 | 2 |
| 2015 | 0 | 3 |
| 2016 | 1 | 2 |
| 2017 | 3 | 3 |
| 2018 | 3 | 2 |
| 2019 | 2 | 2 |
| 2020 | 4 | 0 |
By publication year.
Recent patents
- Imprint apparatus, imprint method, and article manufacturing method8 Dec 2020US 10,859,912 B2Canon Kabushiki Kaisha
- Lithography apparatus, control method therefor, and method of manufacturing article10 Mar 2020US 10,583,608 B2Canon Kabushiki Kaisha
- Detection apparatus, pattern forming apparatus, obtaining method, detection method, and article manufacturing method28 Jan 2020US 10,545,415 B2Canon Kabushiki Kaisha
- Transfer method and apparatus and computer program product21 Jan 2020US 10,538,017 B2Koninklijke Philips N. V.
- Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method10 Sep 2019US 10,409,173 B2Nikon Corporation
- Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method23 May 2019US 2019/0155175 A1Nikon Corporation
- Imprint apparatus, imprint method, and article manufacturing method31 Jan 2019US 2019/0033710 A1Canon Kabushiki Kaisha
- Detection apparatus, pattern forming apparatus, obtaining method, detection method, and article manufacturing method27 Sep 2018US 2018/0275535 A1Canon Kabushiki Kaisha
- Method for making an epoxy resin mold from a lithography patterned microstructure master2 Aug 2018US 2018/0217494 A1The University of North Carolina at Chapel Hill
- Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method30 Nov 2017US 2017/0343905 A1Nikon Corporation
Most cited
By later US patents
- Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method20US 8,054,472 B2Nikon Corporation · 2011
- Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method2US 8,854,632 B2Nikon Corporation · 2014
- Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method2US 9,423,705 B2Nikon Corporation · 2016
- Environmental control of systems for photolithography process1US 10,036,966 B2APPLIED Materials.Inc. · 2018
- Lithographic apparatus and device manufacturing method1US 10,114,300 B2ASML Netherlands B. V. · 2018