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US 10,583,608 B2Granted
Lithography apparatus, control method therefor, and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorShinichi Hirano
Life of this patent
Estimating the term…
Abstract
A lithography apparatus is provided. The lithography apparatus includes a control unit that obtains information of an expected processing count to be processed in a lot by a transfer unit, obtains information of an accumulated processing count, in the transfer unit, of each of originals in a original storage unit, and preferentially selects, from the originals, an original whose process enable count before the accumulated processing count reaches a predetermined count is not smaller than the expected processing count.
Claims28
A lithography apparatus comprising:
- a transfer unit;
- an original storage unit configured to store a plurality of originals;
- a control unit configured to select, from the plurality of originals, an original;
- and
- a conveyance unit configured to extract, from the original storage unit, the original selected by the control unit, and convey the extracted original to an original holding position of the transfer unit, the transfer unit being configured to transfer, to a substrate, a pattern formed on the extracted original,
- wherein the control unit:
- obtains information of an expected processing count to be processed in a lot by the transfer unit,
- obtains information of an accumulated processing count, in the transfer unit, of each of the plurality of originals in the original storage unit,
- selects, from the plurality of originals, an original whose process enable count, which is a count indicating a difference between a predetermined count and an accumulated processing count of the selected original, is equal to the expected processing count, and
- in a case where there is no original whose process enable count is equal to the expected processing count, selects, from the plurality of originals, an original whose process enable count is larger than the expected processing count.
7 more elements
An imprint apparatus comprising:
- an imprint processing device;
- a storage configured to store a plurality of originals;
- a controller configured to select, from the plurality of originals, an original;
- and
- a conveyor configured to extract, from the storage, the original selected by the controller, and convey the extracted original to an original holding position of the imprint processing device, the imprint processing device being configured to transfer, to a substrate, a pattern formed on the extracted original,
- wherein the controller:
- obtains information of an expected processing count to be processed in a lot by the imprint processing device,
- obtains information of an accumulated processing count, in the imprint processing device, of each of the plurality of originals in the storage,
- selects, from the plurality of originals, an original whose process enable count, which is a count indicating a difference between a predetermined count and an accumulated processing count of the selected original, is equal to the expected processing count, and
- in a case where there is no original whose process enable count is equal to the expected processing count, selects, from the plurality of originals, an original whose process enable count.
7 more elements
A lithography apparatus comprising:
- an original storage unit configured to store a plurality of originals;
- a transfer unit configured to transfer a pattern formed on an original to a substrate;
- a control unit configured to select, from the plurality of originals, an original;
- and
- a conveyance unit configured to convey the original selected by the control unit to an original holding position of the transfer unit,
- wherein the control unit:
- obtains information of an expected processing count to be processed in a lot by the transfer unit,
- obtains information of an accumulated processing count, in the transfer unit, of each of the plurality of originals in the original storage unit, and
- selects, from the plurality of originals, an original whose process enable count, which is a count indicating a difference between a predetermined count and an accumulated processing count of the selected original, is larger than or equal to the expected processing count.
6 more elements
An imprint apparatus comprising:
- a storage configured to store a plurality of molds;
- an imprint processing device configured to form a pattern on a substrate using a mold;
- a controller configured to select, from the plurality of molds, a mold;
- and
- a conveyor configured to convey the mold selected by the controller to a mold holding position of the imprint processing device,
- wherein the controller:
- obtains information of an expected processing count to be processed in a lot by the imprint processing device,
- obtains information of an accumulated processing count, in the imprint processing device, of each of the plurality of molds in the storage, and
- selects, from the plurality of molds, a mold whose process enable count, which is a count indicating a difference between a predetermined count and an accumulated processing count of the selected mold, is larger than or equal to the expected processing count.
6 more elements
Dependencies are inferred from the claim text.