Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method

An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

• a movable body that is movable in first and second directions within a predetermined plane, holding the object;
• and
• a mark detecting system that has a plurality of detection areas whose positions are different in the second direction and can simultaneously detect a plurality of marks on the object, wherein
• the marks whose positions are different in the first direction on the object are detected with the mark detecting system by moving the movable body in the first direction, and a number of marks detected by the mark detecting system differs depending on a position of the object in the first direction.

A mark detecting apparatus that detects marks on an object, the apparatus comprising:

• a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object on which marks are each formed at a plurality of positions different from one another;
• and
• a plurality of mark detecting systems that each have a plurality of detection areas whose positions are different in a direction parallel to the second axis and can simultaneously detect the marks at positions different from one another on the object, wherein
• a number of marks on the object that are simultaneously detected by the plurality of mark detecting systems differs depending on a position within the plane of the movable body that mounts the object.