G03F 7/00
Photomechanical
Official title: Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K)
G03F7/00 (Photomechanical) appears on 56,783 US grants and 54,574 published applications in this corpus.
Search patents in G03F- Granted patents
- 56,783
- Published applications
- 54,574
- Assignees
- 5,902
- Inventors
- 63,064
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 226 | 0 |
| 1977 | 188 | 0 |
| 1978 | 196 | 0 |
| 1979 | 182 | 0 |
| 1980 | 247 | 0 |
| 1981 | 383 | 0 |
| 1982 | 260 | 0 |
| 1983 | 291 | 0 |
| 1984 | 301 | 0 |
| 1985 | 380 | 0 |
| 1986 | 366 | 0 |
| 1987 | 396 | 0 |
| 1988 | 412 | 0 |
| 1989 | 648 | 0 |
| 1990 | 642 | 0 |
| 1991 | 697 | 0 |
| 1992 | 627 | 0 |
| 1993 | 668 | 0 |
| 1994 | 784 | 0 |
| 1995 | 651 | 0 |
| 1996 | 699 | 0 |
| 1997 | 874 | 0 |
| 1998 | 1133 | 0 |
| 1999 | 1194 | 0 |
| 2000 | 1255 | 0 |
| 2001 | 1420 | 615 |
| 2002 | 1423 | 1812 |
| 2003 | 1584 | 2039 |
| 2004 | 1672 | 2240 |
| 2005 | 1411 | 2641 |
| 2006 | 1677 | 2722 |
| 2007 | 1541 | 2496 |
| 2008 | 1569 | 2584 |
| 2009 | 1473 | 2504 |
| 2010 | 1803 | 2349 |
| 2011 | 1633 | 2089 |
| 2012 | 1727 | 2033 |
| 2013 | 1848 | 1984 |
| 2014 | 2151 | 1983 |
| 2015 | 2034 | 2206 |
| 2016 | 1992 | 2091 |
| 2017 | 1917 | 1870 |
| 2018 | 1753 | 2010 |
| 2019 | 1959 | 2154 |
| 2020 | 1841 | 2180 |
| 2021 | 1638 | 1991 |
| 2022 | 1507 | 2122 |
| 2023 | 1479 | 2186 |
| 2024 | 1429 | 2158 |
| 2025 | 1529 | 1966 |
| 2026 | 1073 | 1549 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/70Microphotolithographic exposure25,117
- G03F 7/004Photosensitive materials18,411
- G03F 7/26Processing photosensitive materials8,853
- G03F 7/20Exposure8,342
- G03F 7/16Coating processes4,072
- G03F 7/0002Lithographic processes using patterning methods other than those involving the exposure to3,900
- G03F 7/0005Production of optical devices or components in so far as characterised by2,678
- G03F 7/0035Multiple processes1,020
All 15 subgroupsShow fewer
- G03F 7/002Photomechanical: using materials containing microcapsules772
- G03F 7/0037Production of three-dimensional images675
- G03F 7/12Production of screen printing forms or similar printing forms265
- G03F 7/0017Photomechanical: for the production of embossing, cutting or similar devices184
- G03F 7/0015Production of aperture devices, microporous systems or stamps166
- G03F 7/0012Processes making use of the tackiness of the photolithographic materials87
- G03F 7/14Production of collotype printing forms4
Recent patents
- Method of fabricating metal mask6 Oct 2026US 12,752,329 B2Darwin Precisions Corporation
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Cultivating methods and apparatuses8 Oct 2026US 2026/0305597 A1
- Imprint apparatus, imprint method and article manufacturing method8 Oct 2026US 2026/0307325 A1Canon Kabushiki Kaisha
- Method for manufacturing optical element, and optical element8 Oct 2026US 2026/0307345 A1Canon Kabushiki Kaisha
- Method for Multicolor Lithography Using Mechanical Force8 Oct 2026US 2026/0308288 A1California Institute of Technology
- Cooling system, a semiconductor apparatus including the same, and a method of replacing a filter using the same8 Oct 2026US 2026/0309362 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Cut-mask patterning process for fin-like field effect transistor (FinFET) device3,286US 9,236,267 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof1,998US 5,143,854 AAffymax Technologies N.V. · 1992
- Array of oligonucleotides on a solid substrate1,585US 5,445,934 AAffymax Technologies N.V. · 1995
- Apparatus for production of three-dimensional objects by stereolithography1,471US 4,575,330 AUVP, Inc. · 1986
- Arrays of materials attached to a substrate1,410US 5,744,305 AAffymetrix, Inc. · 1998