G03F 7/16
Coating processes
Official title: Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74)
G03F7/16 (Coating processes) appears on 4,072 US grants and 4,542 published applications in this corpus.
Search patents in G03F- Granted patents
- 4,072
- Published applications
- 4,542
- Assignees
- 1,002
- Inventors
- 8,035
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 16 | 0 |
| 1977 | 10 | 0 |
| 1978 | 16 | 0 |
| 1979 | 3 | 0 |
| 1980 | 9 | 0 |
| 1981 | 21 | 0 |
| 1982 | 13 | 0 |
| 1983 | 26 | 0 |
| 1984 | 13 | 0 |
| 1985 | 32 | 0 |
| 1986 | 24 | 0 |
| 1987 | 34 | 0 |
| 1988 | 23 | 0 |
| 1989 | 48 | 0 |
| 1990 | 26 | 0 |
| 1991 | 26 | 0 |
| 1992 | 29 | 0 |
| 1993 | 39 | 0 |
| 1994 | 39 | 0 |
| 1995 | 42 | 0 |
| 1996 | 34 | 0 |
| 1997 | 47 | 0 |
| 1998 | 80 | 0 |
| 1999 | 87 | 0 |
| 2000 | 80 | 0 |
| 2001 | 84 | 45 |
| 2002 | 76 | 85 |
| 2003 | 89 | 81 |
| 2004 | 71 | 106 |
| 2005 | 58 | 97 |
| 2006 | 46 | 88 |
| 2007 | 41 | 108 |
| 2008 | 38 | 86 |
| 2009 | 51 | 68 |
| 2010 | 62 | 64 |
| 2011 | 55 | 75 |
| 2012 | 64 | 82 |
| 2013 | 54 | 73 |
| 2014 | 82 | 132 |
| 2015 | 96 | 175 |
| 2016 | 150 | 243 |
| 2017 | 194 | 388 |
| 2018 | 204 | 324 |
| 2019 | 286 | 356 |
| 2020 | 275 | 352 |
| 2021 | 233 | 244 |
| 2022 | 214 | 273 |
| 2023 | 211 | 255 |
| 2024 | 202 | 275 |
| 2025 | 192 | 264 |
| 2026 | 127 | 203 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/162Coating on a rotating support1,414
- G03F 7/168Finishing the coated layer1,354
- G03F 7/165Monolayers242
- G03F 7/161Using a previously coated surface205
- G03F 7/167From the gas phase, by plasma deposition187
- G03F 7/164Using electric, electrostatic or magnetic means130
- G03F 7/18Coating curved surfaces77
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Coating device and image forming system29 Sep 2026US 12,746,762 B2Ricoh Company, Ltd.
- Storage and transfer module and substrate treatment apparatus including storage and transfer module29 Sep 2026US 12,748,355 B2Semes Co., Ltd.
- Technologies for aligned vias29 Sep 2026US 12,751,262 B2Intel Corporation
- Resist underlayer film-forming composition containing terminal-blocked reaction product22 Sep 2026US 12,743,019 B2Nissan Chemical Corporation
- Cultivating methods and apparatuses8 Oct 2026US 2026/0305597 A1
- Negative resist composition and method for producing resist pattern8 Oct 2026US 2026/0310078 A1Sumitomo Chemical Company, Limited
- Lithography method8 Oct 2026US 2026/0310079 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography method8 Oct 2026US 2026/0310082 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Resist pump buffer tank and method of resist defect reduction8 Oct 2026US 2026/0310083 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Formation of microstamped patterns on surfaces and derivative articles1,049US 5,512,131 APresident and Fellows of Harvard College · 1996
- Substrate processing method and substrate processing apparatus490US 6,620,251 B2Tokyo Electron Limited · 2003
- Substrate processing system, coating/developing apparatus, and substrate processing apparatus485US 7,379,785 B2Tokyo Electron Limited · 2008
- Coater/developer, coating/developing method, and storage medium469US 7,591,601 B2Tokyo Electron Limited · 2009
- Radiation patternable CVD film460US 8,465,903 B2APPLIED Materials.Inc. · 2013