US 6,620,251 B2 · Substrate processing method and substrate processing apparatus

Abstract

A closed container composed of a lid body and a lower container are provided in a cover body, and a supply pipe for nitrogen gas is connected to the cover body. A light source unit including UV lamps in the lid body is provided to face a mounting table in the closed container, and a gas supply path for HMDS gas is provided on the outer side from the light source unit. The inside of the cover body is first brought to a nitrogen atmosphere, a wafer is irradiated with ultraviolet rays with the lid body of the closed container opened to perform cleaning. Subsequently, the lid body is closed and the HMDS gas is introduced into the closed container to perform hydrophobic processing for the wafer. This removes deposits such as organic substances adhering to the wafer W through the irradiation with the ultraviolet rays, thereby improving coating properties of a resist solution.

Claims7

Dependent claims

A substrate processing apparatus, comprising:

a processing chamber;
a mounting table provided in the processing chamber for mounting theron a substrate;
a light source for irradiating the substrate mounted on the mounting table with a light;
a gas supplier for introducing a gas absorbing no light into the processing chamber;
and
a hydrophobing unit for supplying a hydrophobic processing gas into the processing chamber;
wherein the light source and the hydrophobing unit are configured to be movable above the mounting table.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

09/799,562Filed 7 Mar 2001

Priority

JP 2000-631928 Mar 2000

Published

US 2001/0021486 A113 Sep 2001

Granted

16 Sep 2003

Term ends

Not estimatedThe source records don’t support an estimate.

Classification10 codes

H10P 70/12
Cleaning before device manufacture, i.e. Begin-Of-Line process: by dry cleaning only
B08B 7/0057
By radiant energy, e.g. UV, laser, light beam or the like: by ultraviolet radiation
G03F 7/16
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g.…
H10P 72/0406
Apparatus for fluid treatment: for cleaning followed by drying, rinsing, stripping, blasting or the like

Substrate processing method and substrate processing apparatus

Life of this patent

Substrate processing method and substrate processing apparatus

Life of this patent

Abstract

Claims7