G03F 7/165
Monolayers
Official title: {Monolayers, e.g. Langmuir-Blodgett}
G03F7/165 (Monolayers) appears on 242 US grants and 266 published applications in this corpus.
Search patents in G03F- Granted patents
- 242
- Published applications
- 266
- Assignees
- 124
- Inventors
- 667
- Latest grant
- 23 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 4 | 0 |
| 2000 | 3 | 0 |
| 2001 | 3 | 0 |
| 2002 | 6 | 9 |
| 2003 | 5 | 7 |
| 2004 | 9 | 21 |
| 2005 | 10 | 16 |
| 2006 | 2 | 7 |
| 2007 | 7 | 12 |
| 2008 | 6 | 7 |
| 2009 | 12 | 7 |
| 2010 | 10 | 10 |
| 2011 | 7 | 14 |
| 2012 | 11 | 17 |
| 2013 | 7 | 12 |
| 2014 | 14 | 11 |
| 2015 | 7 | 10 |
| 2016 | 11 | 15 |
| 2017 | 21 | 21 |
| 2018 | 11 | 5 |
| 2019 | 13 | 11 |
| 2020 | 7 | 9 |
| 2021 | 8 | 11 |
| 2022 | 4 | 6 |
| 2023 | 6 | 9 |
| 2024 | 8 | 6 |
| 2025 | 5 | 8 |
| 2026 | 4 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Lithography apparatus with improved stability23 Jun 2026US 12,663,733 B2ASML Netherlands B. V.
- Method of forming patterned structures2 Jun 2026US 12,648,420 B2ASM IP Holding B. V.
- Flow cells13 Jan 2026US 12,523,931 B2Illumina Cambridge Limited
- Substrate treating composition and method for fabricating a semiconductor device using the same6 Jan 2026US 12,517,432 B2Nissan Chemical Corporation
- In-situ deposition and densification treatment for metal-comprising resist layer2 Dec 2025US 12,487,523 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Positive-type multilayer molecular film photoresist having molecular line structure13 Aug 2026US 2026/0235955 A1Samsung Electronics Co., Ltd.
- Substrate treating method and substrate treating apparatus23 Jul 2026US 2026/0215232 A1SCREEN Holdings Co., Ltd.
- Substrate, method for manufacturing substrate for manufacturing semiconductor, and method for manufacturing semiconductor substrate9 Jul 2026US 2026/0194809 A1Jsr Corporation
- Resin composition for forming phase-separated structure and method for producing structure including phase-separated structure11 Jun 2026US 2026/0159718 A1Tokyo Ohka Kogyo.Co., Ltd.
- Positive tone metal oxide resist development11 Jun 2026US 2026/0161092 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Formation of microstamped patterns on surfaces and derivative articles1,049US 5,512,131 APresident and Fellows of Harvard College · 1996
- Atomic layer deposition lithography343US 8,932,802 B2APPLIED Materials.Inc. · 2015
- Microcontact printing on surfaces and derivative articles267US 6,180,239 B2President and Fellows of Harvard College · 2001
- Methods of etching articles via microcontact printing243US 5,900,160 APresident and Fellows of Harvard College · 1999
- High resolution patterning on solid substrates236US 5,079,600 A1992