Substrate treating composition and method for fabricating a semiconductor device using the same

A substrate treating composition, consisting essentially of a solid content and a solvent, the solid content consisting a first monomer, a second monomer, a dehydration-condensation product of the first monomer and the second monomer, and an acid, wherein

• the first monomer is represented by Formula 1:
• X—Si(R1)2(R2) [Formula 1]
• wherein each of R1 and R2 is an alkyl group of 1 to 20 carbon atoms or an alkoxy group of 1 to 20 carbon atoms, and X is represented by Formula 2 or Formula 4:
• the second monomer is represented by Formula 7:
• Y—Si(R3)3 [Formula 7]
• wherein R3 is an alkoxy group of 1 to 20 carbon atoms, and Y is represented by Formula 8, Formula 9, Formula 10, Formula 11, Formula 12:
• in which Ts is a p-toluenesulfonyl group,
• in which Ms is a methanesulfonyl group,
• in which Ms is a methanesulfonyl group,
• wherein a molecular weight of the dehydration-condensation product of the first monomer and the second monomer is from 1,000 g/mol to 100,000 g/mol.