Lithography apparatus with improved stability
AssigneeASML Netherlands B.V.
InventorsPaulus Albertus Van Hal, Diego Millo, Aleksandar Nikolov Zdravkov, Marcus Adrianus Van De Kerkhof
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Abstract
The present invention relates to methods for improving the resistance of lithography substrate holders to corrosion. The present invention also relates to systems comprising lithography substrate holders with improved corrosion resistance, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates with backsides configured to preferentially corrode when used in lithography. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.
Claims5
A system comprising:
- a lithography substrate holder having burls comprising diamond-like carbon and/or diamond,
- wherein at least a portion of the burls of the substrate holder comprise comprises a self-assembled monolayer (SAM A) configured to provide anti-corrosion benefits for the at least a portion of the burls,
- wherein the SAM A comprises a dipole in the direction pointing away from the surface of the substrate holder to thereby
- increase a nobility of the burls compared to a nobility of a backside of a wafer disposed on the substrate holder;
- and/or
- to increase an electron volt difference between the burls and a backside of a wafer disposed on the substrate holder.
Dependencies are inferred from the claim text.