Substrate treating method and substrate treating apparatus

A substrate treating apparatus for forming a self-assembled monolayer on a surface of a substrate, the substrate treating apparatus comprising:

• a treatment liquid nozzle that supplies a treating liquid containing molecules capable of forming the self-assembled monolayer to the surface;
• a removal liquid nozzle that supplies a removal liquid to the surface after supply of the treating liquid to remove the molecules not chemically adsorbing;
• and
• a surface modification liquid nozzle that performs surface modification by supplying a surface modification liquid to a region where the molecule does not exist, the region being the surface after removal of the molecule by the removal liquid nozzle, to a region where chemical adsorption of the molecules is possible,
• wherein the treatment liquid nozzle also supplies the treating liquid to the surface of the substrate after the surface modification.

A substrate treatment apparatus for forming a self-assembled monolayer on a surface of a substrate, the substrate treatment apparatus comprising:

• a treatment liquid nozzle that supplies a treatment liquid containing molecules capable of forming the self-assembled monolayer to the surface;
• a removal liquid nozzle that supplies a removal liquid to the surface after supply of the treatment liquid to remove the molecules not chemically adsorbing;
• and
• an ozone gas nozzle that performs surface modification by supplying ozone gas to a region where the molecule does not exist, the region being the surface after removal of the molecule by the removal liquid nozzle, to a region where chemical adsorption of the molecules is possible,
• wherein the treatment liquid nozzle also supplies the treatment liquid to the surface of the substrate after the surface modification.

A substrate treatment apparatus for forming a self-assembled monolayer on a surface of a substrate, the substrate treatment apparatus comprising:

• a treatment liquid nozzle that supplies a treatment liquid containing molecules capable of forming the self-assembled monolayer to the surface;
• a removal liquid nozzle that supplies a removal liquid to the surface after supply of the treatment liquid to remove the molecules not chemically adsorbing;
• and
• a light source that performs surface modification by irradiating a region where the molecule does not exist with ultraviolet rays, the region being the surface after removal of the molecule by the removal liquid nozzle, to a region where chemical adsorption of the molecules is possible,
• wherein the treatment liquid nozzle also supplies the treatment liquid to the surface of the substrate after the surface modification.

A substrate treatment apparatus for forming a self-assembled monolayer on a surface of a substrate, the substrate treatment apparatus comprising:

• a treatment liquid nozzle that supplies a treatment liquid containing molecules capable of forming the self-assembled monolayer to the surface;
• a removal liquid nozzle that supplies a removal liquid to the surface after supply of the treatment liquid to remove the molecules that are not chemically adsorbed;
• and
• a gas nozzle that performs surface modification by supplying a gas containing moisture to a region where the molecule does not exist, the region being the surface after removal of the molecule by the removal liquid nozzle, to a region where chemical adsorption of the molecules is possible,
• wherein the treatment liquid nozzle also supplies the treatment liquid to the surface of the substrate after the surface modification.