Resin composition for forming phase-separated structure and method for producing structure including phase-separated structure
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorTakehiro SESHIMO
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Abstract
A resin composition for forming a phase-separated structure capable of forming a coating film with a uniform thickness and forming a thick film having a well phase-separated structure while suppressing the generation of defects in the film, and a method for producing a structure including a phase-separated structure using the resin composition. The resin composition includes a block copolymer and an organic solvent including propylene glycol monomethyl ether acetate and a solvent having an ester group and a boiling point at atmospheric pressure of 225° C. or more and 275° C. or less.
Claims6
A resin composition for forming a phase-separated structure comprising:
- a block copolymer (A);
- and
- an organic solvent(S),
- wherein the organic solvent(S) comprises propylene glycol monomethyl ether acetate (S1) and a solvent (S2) having an ester group and a boiling point at atmospheric pressure of 225° C. or more and 275° C. or less.
Dependencies are inferred from the claim text.