Method of forming patterned structures
AssigneeASM IP Holding B.V.
InventorsYoann Tomczak, Ivan Zyulkov, David Kurt de Roest, Michael Eugene Givens, Daniele Piumi, Charles Dezelah
Life of this patent
Estimating the term…
Abstract
Methods of forming patterned features on a surface of a substrate are disclosed. Exemplary methods include gas-phase formation of a layer comprising an oxalate compound on a surface of the substrate. Portions of the layer comprising the oxalate compound can be exposed to radiation or active species that form exposed and unexposed portions. Material can be selectively deposed onto the exposed or the unexposed portions.
Claims20
A method of forming patterned features on a surface of a substrate, the method comprising the steps of:
- providing a substrate within a gas-phase reaction chamber;
- providing an oxalate derivative precursor to the reaction chamber;
- and
- forming a layer comprising an oxalate compound on a surface of the substrate within the reaction chamber,
- wherein the oxalate derivative precursor comprises a compound having a chemical structure according to formula (i),
- wherein X is a halogen and R is a hydrocarbyl group or a haloalkyl group.
A method of forming patterned features on a surface of a substrate, the method comprising the steps of:
- providing a substrate within a gas-phase reaction chamber;
- providing an oxalate derivative precursor to the reaction chamber;
- forming a layer comprising an oxalate compound on the surface of the substrate within the reaction chamber;
- exposing portions of the layer comprising an oxalate compound to one or more of radiation and excited species to form exposed portions and unexposed portions of the layer;
- and
- selectively depositing material on the exposed portions or the unexposed portions, wherein the oxalate derivative precursor comprises a compound having a chemical structure according to formula (i),
- wherein X is a halogen and R is a hydrocarbyl group or a haloalkyl group.
A method of forming patterned features on a surface of a substrate, the method comprising the steps of:
- providing a substrate within a gas-phase reaction chamber;
- providing an oxalate derivative precursor to the reaction chamber;
- forming a layer comprising an oxalate compound on a surface of the substrate within the reaction chamber;
- and
- exposing portions of the layer comprising an oxalate compound to one or more of radiation and excited species to form exposed portions and unexposed portions,
- wherein the oxalate derivative precursor comprises a halide, and
- wherein the oxalate derivative precursor comprises a compound having a chemical structure according to formula (i),
- wherein X is a halogen and R is a hydrocarbyl group or a haloalkyl group.
Dependencies are inferred from the claim text.