Negative resist composition and method for producing resist pattern

A negative resist composition comprising:

• a resin (A1) including a structural unit represented by a formula (a2-1) and a structural unit represented by a formula (a2-4);
• an acid generator (B);
• a crosslinking agent (E);
• and
• an aromatic compound (I) having a molecular weight of 2,000 or less and having three or more phenolic hydroxyl groups, wherein
• in the formula (a2-1) and the formula (a2-4),
• Ra7 and Ra13 each independently represent a hydrogen atom or a methyl group,
• Ra10 and Ra14 each independently represent an alkyl group having 1 to 6 carbon atoms,
• Ra15 represents a hydrocarbon group having 1 to 12 carbon atoms,
• m1 represents an integer of 0 to 4, when m1 is 2 or more, a plurality of Ra10 may be same or different from each other,
• m2 represents an integer of 1 to 4,
• provided that a sum of m1 and m2 is 5 or less,
• m3 represents an integer of 0 to 4, when m3 is 2 or more, a plurality of Ra14 may be same or different from each other,
• m4 represents an integer of 1 to 4, when m4 is 2 or more, a plurality of Ra15 may be same or different from each other, and
• provided that a sum of m3 and m4 is 5 or less.