G03F 7/26
Processing photosensitive materials
Official title: Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence)
G03F7/26 (Processing photosensitive materials) appears on 8,853 US grants and 9,649 published applications in this corpus.
Search patents in G03F- Granted patents
- 8,853
- Published applications
- 9,649
- Assignees
- 1,685
- Inventors
- 14,449
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 43 | 0 |
| 1977 | 25 | 0 |
| 1978 | 33 | 0 |
| 1979 | 30 | 0 |
| 1980 | 45 | 0 |
| 1981 | 72 | 0 |
| 1982 | 46 | 0 |
| 1983 | 55 | 0 |
| 1984 | 59 | 0 |
| 1985 | 50 | 0 |
| 1986 | 48 | 0 |
| 1987 | 52 | 0 |
| 1988 | 61 | 0 |
| 1989 | 74 | 0 |
| 1990 | 70 | 0 |
| 1991 | 67 | 0 |
| 1992 | 72 | 0 |
| 1993 | 101 | 0 |
| 1994 | 106 | 0 |
| 1995 | 91 | 0 |
| 1996 | 86 | 0 |
| 1997 | 100 | 0 |
| 1998 | 149 | 0 |
| 1999 | 159 | 0 |
| 2000 | 159 | 0 |
| 2001 | 217 | 95 |
| 2002 | 206 | 214 |
| 2003 | 227 | 313 |
| 2004 | 208 | 320 |
| 2005 | 159 | 320 |
| 2006 | 153 | 328 |
| 2007 | 132 | 326 |
| 2008 | 168 | 303 |
| 2009 | 150 | 288 |
| 2010 | 182 | 347 |
| 2011 | 180 | 299 |
| 2012 | 242 | 322 |
| 2013 | 261 | 357 |
| 2014 | 321 | 408 |
| 2015 | 402 | 512 |
| 2016 | 447 | 580 |
| 2017 | 440 | 532 |
| 2018 | 396 | 494 |
| 2019 | 450 | 532 |
| 2020 | 387 | 471 |
| 2021 | 328 | 395 |
| 2022 | 307 | 432 |
| 2023 | 294 | 399 |
| 2024 | 268 | 397 |
| 2025 | 297 | 394 |
| 2026 | 178 | 271 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/30Imagewise removal using liquid means3,758
- G03F 7/40Treatment after imagewise removal2,824
- G03F 7/42Stripping or agents therefor1,580
- G03F 7/38Treatment before imagewise removal1,478
- G03F 7/36Imagewise removal not covered by groups g03f7/30 - g03f7/34402
- G03F 7/34Imagewise removal by selective transfer297
- G03F 7/265Selective reaction with inorganic or organometallic reagents after image-wise exposure261
- G03F 7/28For obtaining powder images133
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Control of metallic contamination from metal-containing photoresist29 Sep 2026US 12,748,352 B2Lam Research Corporation
- Compound, (co)polymer, composition, method for forming pattern, and method for producing compound15 Sep 2026US 12,735,382 B2Mitsubishi Gas Chemical Company, Inc.
- Resist composition and method for forming resist pattern15 Sep 2026US 12,736,875 B2Tokyo Ohka Kogyo.Co., Ltd.
- Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same15 Sep 2026US 12,736,876 B2LG Chem.Ltd.
- Method for Multicolor Lithography Using Mechanical Force8 Oct 2026US 2026/0308288 A1California Institute of Technology
- Method and apparatus for fabrication of large area 3d photonic crystals with embedded waveguides8 Oct 2026US 2026/0310072 A1UNM Rainforest Innovations
- Gas-based development of organometallic resist in an oxidizing halogen-donating environment8 Oct 2026US 2026/0310073 A1Inpria Corporation
- Magnetic annealing of metal oxide based resists8 Oct 2026US 2026/0310086 A1APPLIED Materials.Inc.
- Polyimide-based resin precursor, photosensitive resin composition, method for producing resin film, and amic acid ester compound1 Oct 2026US 2026/0297261 A1Resonac Corporation
Most cited
By later US patents
- Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof1,998US 5,143,854 AAffymax Technologies N.V. · 1992
- Array of oligonucleotides on a solid substrate1,585US 5,445,934 AAffymax Technologies N.V. · 1995
- Arrays of materials attached to a substrate1,410US 5,744,305 AAffymetrix, Inc. · 1998
- Very large scale immobilized polymer synthesis967US 5,424,186 AAffymax Technologies N.V. · 1995
- Method of detecting nucleic acids962US 5,800,992 A1998