G03F 7/42
Stripping or agents therefor
G03F7/42 (Stripping or agents therefor) appears on 1,580 US grants and 1,771 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,580
- Published applications
- 1,771
- Assignees
- 552
- Inventors
- 3,771
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 1 | 0 |
| 1978 | 6 | 0 |
| 1979 | 5 | 0 |
| 1980 | 7 | 0 |
| 1981 | 8 | 0 |
| 1982 | 4 | 0 |
| 1983 | 8 | 0 |
| 1984 | 5 | 0 |
| 1985 | 4 | 0 |
| 1986 | 5 | 0 |
| 1987 | 4 | 0 |
| 1988 | 16 | 0 |
| 1989 | 12 | 0 |
| 1990 | 15 | 0 |
| 1991 | 10 | 0 |
| 1992 | 9 | 0 |
| 1993 | 19 | 0 |
| 1994 | 13 | 0 |
| 1995 | 17 | 0 |
| 1996 | 21 | 0 |
| 1997 | 27 | 0 |
| 1998 | 35 | 0 |
| 1999 | 40 | 0 |
| 2000 | 48 | 0 |
| 2001 | 66 | 28 |
| 2002 | 78 | 78 |
| 2003 | 67 | 89 |
| 2004 | 64 | 113 |
| 2005 | 41 | 91 |
| 2006 | 40 | 119 |
| 2007 | 42 | 109 |
| 2008 | 43 | 86 |
| 2009 | 41 | 73 |
| 2010 | 54 | 72 |
| 2011 | 57 | 67 |
| 2012 | 54 | 54 |
| 2013 | 51 | 54 |
| 2014 | 40 | 64 |
| 2015 | 51 | 63 |
| 2016 | 46 | 51 |
| 2017 | 51 | 59 |
| 2018 | 44 | 61 |
| 2019 | 31 | 49 |
| 2020 | 51 | 59 |
| 2021 | 39 | 54 |
| 2022 | 51 | 65 |
| 2023 | 32 | 54 |
| 2024 | 34 | 51 |
| 2025 | 49 | 70 |
| 2026 | 20 | 38 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Substrate treatment device and substrate treatment method25 Aug 2026US 12,721,085 B2SCREEN Holdings Co., Ltd.
- Substrate processing apparatus, substrate processing method, training data generation method, training method, training device, trained model creation method, and trained model4 Aug 2026US 12,699,361 B2SCREEN Holdings Co., Ltd.
- Method for producing a package substrate including a composition for removing the photoresist7 Jul 2026US 12,677,676 B2Mitsubishi Gas Chemical Company, Inc.
- Cleaning compositions16 Jun 2026US 12,655,367 B2Fujifilm Electronic Materials U.S.A., Inc.
- Systems and methods for silicon microstructures fabricated via greyscale DRIE with SOI release9 Jun 2026US 12,652,976 B2Lawrence Livermore National Security, LLC
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297466 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297467 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297468 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297469 A1Dongwoo Fine-Chem Co., Ltd.
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing wiring substrate1 Oct 2026US 2026/0299416 A1Resonac Corporation
Most cited
By later US patents
- Method for removing photoresist layer from substrate by ozone treatment543US 4,341,592 ATexas Instruments Incorporated · 1982
- Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching534US 6,864,041 B2International Business Machines Corporation · 2005
- Apparatus for removing organic resist from semiconductor485US 5,961,775 AFujitsu Limited · 1999
- Laser stripping improvement by modified gas composition477US 6,350,391 B1Oramir Semiconductor Equipment Ltd. · 2002
- Method of ashing layers, and apparatus for ashing layers447US 4,812,201 ATokyo Electron Limited · 1989