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US 6,350,391 B1Granted
Laser stripping improvement by modified gas composition
AssigneeOramir Semiconductor Equipment Ltd.
InventorsBoris Livshits, Menachem Genut, Ofer Tehar-Zahav
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Abstract
A method and apparatus for accelerating a laser stripping process carried out in a reactive gas mixture, comprising carrying out the stripping process in the presence of an accelerating effective amount of NxOy gas.
Claims5
A method of stripping photoresists from wafers, comprising the steps of:
- (a) providing a process chamber containing a wafer from which photoresists are to be stripped;
- (b) subjecting a stream of oxygen to corona discharge to produce a stream of a mixture of oxygen and ozone;
- (c) concurrently and separately subjecting a stream of nitrous oxide to corona discharge to produce a stream of a mixture of nitrogen oxides;
- (d) passing said two streams of mixtures together to said process chamber whereby said wafer contacts them;
- (e) concurrently irradiating said wafer by a pulsed UV laser beam;
- and
- (f) discharging said stream of mixtures from said chamber.
4 more elements
Dependencies are inferred from the claim text.