Method for removing photoresist layer from substrate by ozone treatment

In the fabrication of an electronic structure, a method of removing a layer of photoresist material from a substrate surface of different material, said method comprising:

• continuously serially feeding substrates having layers of photoresist material thereon into a reaction zone of a reactor by controllably directing air jets onto successive ones of said substrates to impart movement thereto along a predetermined path which traverses the reaction zone of said reactor,
• introducing a gaseous atmosphere containing ozone as an active reagent in an amount sufficient to react with all of the photoresist material in each of said layers thereof on the respective substrates into the reaction zone of said reactor,
• sequentially exposing the respective layers of photoresist material on said substrates to said ozone-containing gaseous atmosphere as said substrates successively traverse the reaction zone of said reactor for removal of the respective layers of photoresist material,
• respectively removing photoresist material from the underlying substrate surface of each substrate in response to exposure of the layer of photoresist material to the ozone while continuously maintaining a sufficient concentration of ozone molecules in the area of the photoresist material at least until the layer of photoresist material is removed, and
• exhausting excess ozone and reaction products including the photoresist material of the removed layers from the reactor.

In the fabrication of an electronic structure, a method of removing a layer of photoresist material from a substrate surface of different material, said method comprising:

• positioning the substrate on which the photoresist layer is disposed in a reaction zone of a reactor,
• heating the photoresist layer on said substrate to a predetermined temperature elevated above ambient temperature,
• introducing a gaseous atmosphere containing ozone as an active reagent in an amount sufficient to react with all of the photoresist material in said layer thereof into the reaction zone of said reactor,
• maintaining the ozone-containing gaseous atmosphere at approximately ambient temperature during its introduction into the reaction zone of said reactor while the photoresist layer is maintained at said elevated temperature by cycling coolant material about an inlet which communicates with the reaction zone of said reactor and through which the ozone-containing gaseous atmosphere is introduced into the reaction zone of said reactor,
• exposing said layer of photoresist material to said ozone-containing gaseous atmosphere,
• removing photoresist material from the underlying substrate surface in response to exposure of the layer of photoresist material to the ozone while continuously maintaining a sufficient concentration of ozone molecules in the area of the photoresist material at least until the layer of photoresist material is removed, and
• exhausting excess ozone and reaction products including the photoresist material of the removed layer from the reactor.