G03F 7/422
Using liquids only
Official title: {using liquids only (G03F7/421 takes precedence)}
G03F7/422 (Using liquids only) appears on 1,075 US grants and 1,243 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,075
- Published applications
- 1,243
- Assignees
- 399
- Inventors
- 2,440
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 5 | 0 |
| 1979 | 5 | 0 |
| 1980 | 6 | 0 |
| 1981 | 3 | 0 |
| 1982 | 1 | 0 |
| 1983 | 7 | 0 |
| 1984 | 4 | 0 |
| 1985 | 2 | 0 |
| 1986 | 4 | 0 |
| 1987 | 2 | 0 |
| 1988 | 9 | 0 |
| 1989 | 5 | 0 |
| 1990 | 9 | 0 |
| 1991 | 6 | 0 |
| 1992 | 6 | 0 |
| 1993 | 8 | 0 |
| 1994 | 9 | 0 |
| 1995 | 11 | 0 |
| 1996 | 15 | 0 |
| 1997 | 16 | 0 |
| 1998 | 17 | 0 |
| 1999 | 23 | 0 |
| 2000 | 30 | 0 |
| 2001 | 41 | 18 |
| 2002 | 52 | 54 |
| 2003 | 45 | 69 |
| 2004 | 41 | 83 |
| 2005 | 32 | 64 |
| 2006 | 28 | 66 |
| 2007 | 26 | 74 |
| 2008 | 29 | 57 |
| 2009 | 29 | 58 |
| 2010 | 37 | 52 |
| 2011 | 45 | 52 |
| 2012 | 40 | 43 |
| 2013 | 40 | 42 |
| 2014 | 34 | 51 |
| 2015 | 44 | 38 |
| 2016 | 33 | 41 |
| 2017 | 34 | 39 |
| 2018 | 29 | 43 |
| 2019 | 19 | 35 |
| 2020 | 39 | 43 |
| 2021 | 26 | 36 |
| 2022 | 36 | 46 |
| 2023 | 23 | 30 |
| 2024 | 24 | 34 |
| 2025 | 33 | 50 |
| 2026 | 10 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Substrate processing apparatus, substrate processing method, training data generation method, training method, training device, trained model creation method, and trained model4 Aug 2026US 12,699,361 B2SCREEN Holdings Co., Ltd.
- Method for producing a package substrate including a composition for removing the photoresist7 Jul 2026US 12,677,676 B2Mitsubishi Gas Chemical Company, Inc.
- Cleaning compositions16 Jun 2026US 12,655,367 B2Fujifilm Electronic Materials U.S.A., Inc.
- Systems and methods for silicon microstructures fabricated via greyscale DRIE with SOI release9 Jun 2026US 12,652,976 B2Lawrence Livermore National Security, LLC
- Substrate processing apparatus and method thereof2 Jun 2026US 12,645,146 B2Semes Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297466 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297467 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297468 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297469 A1Dongwoo Fine-Chem Co., Ltd.
- Compositions containing n-substituted piperazines for electronic manufacturing applications24 Sep 2026US 2026/0288011 A1Dow Global Technologies LLC
Most cited
By later US patents
- Cleaning compositions for removing etching residue and method of using150US 5,334,332 AEKC Technology, Inc. · 1994
- Method for lifting off photoresist beneath an overlayer147US 8,357,244 B1Western Digital (Fremont), LLC · 2013
- Removal of resist or residue from semiconductors using supercritical carbon dioxide145US 6,306,564 B1Tokyo Electron Limited · 2001
- Post clean treatment composition comprising an organic acid and hydroxylamine137US 5,981,454 AEKC Technology, Inc. · 1999
- Cleaning liquid for semiconductor devices124US 5,972,862 AMitsubishi Gas Chemical Company, Inc. · 1999