G03F 7/426
Containing organic halogen compounds
Official title: {containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides}
G03F7/426 (Containing organic halogen compounds) appears on 255 US grants and 323 published applications in this corpus.
Search patents in G03F- Granted patents
- 255
- Published applications
- 323
- Assignees
- 126
- Inventors
- 660
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 3 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 3 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 2 | 0 |
| 2001 | 8 | 1 |
| 2002 | 6 | 9 |
| 2003 | 7 | 15 |
| 2004 | 8 | 13 |
| 2005 | 4 | 15 |
| 2006 | 4 | 16 |
| 2007 | 3 | 13 |
| 2008 | 4 | 13 |
| 2009 | 6 | 20 |
| 2010 | 12 | 11 |
| 2011 | 13 | 15 |
| 2012 | 13 | 9 |
| 2013 | 11 | 9 |
| 2014 | 9 | 19 |
| 2015 | 14 | 11 |
| 2016 | 11 | 17 |
| 2017 | 7 | 11 |
| 2018 | 11 | 12 |
| 2019 | 4 | 14 |
| 2020 | 16 | 12 |
| 2021 | 9 | 7 |
| 2022 | 17 | 13 |
| 2023 | 2 | 9 |
| 2024 | 9 | 17 |
| 2025 | 8 | 14 |
| 2026 | 4 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Cleaning compositions16 Jun 2026US 12,655,367 B2Fujifilm Electronic Materials U.S.A., Inc.
- Acid for reactive development of metal oxide resists24 Mar 2026US 12,585,185 B2Tokyo Electron Limited
- Composition for semiconductor processing and processing method10 Mar 2026US 12,570,933 B2Jsr Corporation
- Cleaning solution and method of cleaning wafer20 Jan 2026US 12,532,687 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Treatment liquid, method for washing substrate, and method for removing resist25 Nov 2025US 12,481,218 B2FUJIFILM Corporation
- Stripper composition and method of forming pattern using the same23 Jul 2026US 2026/0211334 A1Ltc Co., Ltd.
- Solvent composition16 Jul 2026US 2026/0201283 A1
- Composition for photoresist removal and method for removing photoresist16 Jul 2026US 2026/0202749 A1Mitsubishi Gas Chemical Company, Inc.
- Acid for reactive development of metal oxide resists9 Jul 2026US 2026/0194810 A1Tokyo Electron Limited
- Apparatus and methods for removing photoresist and polymer coatings18 Jun 2026US 2026/0169390 A1Yield Engineering Systems, Inc.
Most cited
By later US patents
- Stripping and cleaning composition84US 5,571,447 AAshland Inc. · 1996
- Photoresist stripping composition and method72US 4,395,348 AEKC Technology, Inc. · 1983
- Stripping and cleaning composition64US 5,698,503 AAshland Inc. · 1997
- Non-corrosive stripping and cleaning composition58US 5,798,323 AOlin Microelectronic Chemicals, Inc. · 1998
- Acid blend for removing etch residue52US 6,562,726 B1Micron Technology, Inc. · 2003