Acid for reactive development of metal oxide resists

An integrated baking and reactive development apparatus comprising:

• a vacuum chamber coupled to a pumping system comprising a positive displacement pump;
• a hot plate configured to bake a substrate comprising a patterned metal oxide resist (MOR);
• and
• a gas inlet configured to supply a gaseous developer to develop the patterned MOR, the gaseous developer comprising a compound selected from the group consisting of
• an alcohol having an organic group comprising a saturated carbon bonded to a hydroxyl group,
• an aromatic alcohol having the formula ArO—H with Ar being an aromatic compound,
• an amine having a nitrogen bonded to an organic group and hydrogen, and
• a Lewis acid comprising boron and at least one organic substituent from the group consisting of
• an alkyl group having the formula CnH2n+1 with n > 1,
• an alkoxide group having an alkyl bonded to an oxygen, and
• an amide group having a nitrogen bonded to one or two organic substituents.

An integrated baking and reactive development apparatus comprising:

• a vacuum chamber coupled to a pumping system comprising a positive displacement pump, the pumping system comprising no momentum transfer pump or entrapment pump, the vacuum chamber comprising no plasma source configured to generate plasma within the vacuum chamber;
• a hot plate configured to bake a substrate comprising a patterned metal oxide resist (MOR);
• and
• a gas inlet configured to supply a gaseous developer to develop the patterned MOR at a pressure greater than about 1 mTorr, the gaseous developer comprising a compound selected from the group consisting of
• an alcohol having an organic group comprising a saturated carbon bonded to a hydroxyl group,
• an aromatic alcohol having the formula ArO—H with Ar being an aromatic compound,
• an amine having a nitrogen bonded to an organic group and hydrogen, and
• a Lewis acid comprising boron and at least one organic substituent from the group consisting of
• an alkyl group having the formula CnH2n+1 with n > 1,
• an alkoxide group having an alkyl bonded to an oxygen, and
• an amide group having a nitrogen bonded to one or two organic substituents.