Cleaning solution and method of cleaning wafer

A cleaning solution, comprising:

• a first solvent having Hansen solubility parameters of 25>δd>13, 25>δp>3, and 30>δh>4;
• a base, wherein the base includes an organic base or an inorganic base,
• when the base includes an organic base, the organic base is selected from the group consisting of monoethanolamine, monoisopropanolamine, 2-amino-2-methyl-1-propanol, 1H-benzotriazole, 1,2,4-triazole, 1,8-diazabicycloundec-7-ene, tetrabutylammonium hydroxide, tetrapropylammonium hydroxide, and combinations thereof,
• and when the base includes an inorganic base, the inorganic base is selected from the group consisting of ammonium sulfamate, ammonium carbamate, and combinations thereof;
• and
• a surfactant,
• wherein the surfactant is at least one or more of a non-ionic surfactant, a polyethylene oxide, a polypropylene oxide, and combinations thereof,
• wherein the non-ionic surfactant is one or more selected from the group consisting of
• wherein n is the number of repeat units,
• wherein the polyethylene oxide and the polypropylene oxide are one or more selected from the group consisting of
• wherein R, R1, and R2 are same or different, and are substituted or unsubstituted aliphatic, alicyclic, or aromatic groups, and EO/PO is ethylene oxide, propylene oxide, or a copolymer of ethylene oxide and propylene oxide.

A cleaning solution, comprising:

• a first solvent having Hansen solubility parameters of 25>δd>13, 25>δp>3, and 30>δh>4;
• an acid, wherein the acid includes an organic acid,
• wherein the organic acid is selected from the group consisting of ethanedioic acid, methanoic acid, 2-hydroxypropanoic acid, 2-hydroxybutanedioic acid, citric acid, uric acid, trifluoromethanesulfonic acid, benzenesulfonic acid, ethanesulfonic acid, methanesulfonic acid, oxalic acid, maleic acid, carbonic acid, oxoethanoic acid, 2-hydroxyethanoic acid, propanedioic acid, butanedioic acid, 3-oxobutanoic acid, hydroxylamine-o-sulfonic acid, formamidinesulfinic acid, methylsulfamic acid, sulfoacetic acid, 1,1,2,2-tetrafluoroethanesulfonic acid, 1,3-propanedisulfonic acid, nonafluorobutane-1-sulfonic acid, 5-sulfosalicylic acid, trichloroacetic acid, and combinations thereof;
• and
• a surfactant,
• wherein the surfactant includes an ionic surfactant, and at least one of a polyethylene oxide and a polypropylene oxide,
• wherein the ionic surfactant is one or more selected from the group consisting of
• wherein R in the ionic surfactant is a substituted or unsubstituted aliphatic, alicyclic, or aromatic group, and
• wherein the polyethylene oxide and the polypropylene oxide are one or more selected from the group consisting of
• wherein R, R1, and R2 in the polyethylene oxide or polypropylene oxide are same or different, and are substituted or unsubstituted aliphatic, alicyclic, or aromatic groups, and EO/PO is ethylene oxide, propylene oxide, or a copolymer of ethylene oxide and propylene oxide.