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US 12,655,367 B2Granted
Cleaning compositions
AssigneeFujifilm Electronic Materials U.S.A., Inc.
InventorsJieying Jiao, Thomas Dory
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Abstract
This disclosure relates to compositions for cleaning post etching residues on a semiconductor substrate, as well as related cleaning methods.
Claims10
A cleaning method, comprising:
- treating a substrate with a cleaning composition to obtain a treated substrate, the cleaning composition comprising at least one redox agent, at least one chelating agent, at least one organic solvent, at least one alkanolamine, and water;
- wherein the composition has a pH from about 12 to about 14;
- and
- sonicating the treated substrate in the presence of a first rinse solvent to obtain a cleaned substrate.
1 more element
Dependencies are inferred from the claim text.