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US 2026/0297467 A1Published application
Cleaning composition and method of forming photoresist pattern using the same
AssigneeDongwoo Fine-Chem Co., Ltd.
InventorsGI JIN KWUN, BAEK HYUN CHO, HYUNG SUB CHOI
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Abstract
A cleaning composition includes an alcohol-based solvent, and an alkyl acetate or an alkyl formate. A content of the alcohol-based solvent is 50 wt % or more, and less than 100 wt % based on a total weight of the composition. The cleaning composition provides improved pattern stability and enhanced capability of removing a photoresist residue.
Claims13
A cleaning composition, comprising:
- an alcohol-based solvent;
- and
- an alkyl acetate or an alkyl formate,
- wherein a content of the alcohol-based solvent is 50 wt % or more, and less than 100 wt % based on a total weight of the composition.
1 more element
Dependencies are inferred from the claim text.