G03F 7/423
Containing mineral acids or salts thereof, containing mineral oxidizing substances
Official title: {containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds}
G03F7/423 (Containing mineral acids or salts thereof, containing mineral oxidizing substances) appears on 316 US grants and 432 published applications in this corpus.
Search patents in G03F- Granted patents
- 316
- Published applications
- 432
- Assignees
- 160
- Inventors
- 905
- Latest grant
- 9 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 7 | 0 |
| 2000 | 8 | 0 |
| 2001 | 5 | 5 |
| 2002 | 12 | 21 |
| 2003 | 14 | 16 |
| 2004 | 14 | 32 |
| 2005 | 10 | 29 |
| 2006 | 7 | 26 |
| 2007 | 12 | 31 |
| 2008 | 15 | 26 |
| 2009 | 10 | 21 |
| 2010 | 15 | 24 |
| 2011 | 13 | 21 |
| 2012 | 16 | 16 |
| 2013 | 17 | 22 |
| 2014 | 16 | 15 |
| 2015 | 13 | 13 |
| 2016 | 9 | 14 |
| 2017 | 9 | 17 |
| 2018 | 14 | 16 |
| 2019 | 10 | 11 |
| 2020 | 10 | 12 |
| 2021 | 10 | 7 |
| 2022 | 10 | 11 |
| 2023 | 5 | 3 |
| 2024 | 8 | 11 |
| 2025 | 8 | 8 |
| 2026 | 2 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Substrate processing apparatus and method thereof2 Jun 2026US 12,645,146 B2Semes Co., Ltd.
- Apparatus and method for treating substrate9 Dec 2025US 12,491,532 B2Semes Co., Ltd.
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- Substrate processing method and substrate processing apparatus4 Nov 2025US 12,459,010 B2SCREEN Holdings Co., Ltd.
- Substrate processing apparatus and substrate processing method6 Aug 2026US 2026/0225926 A1SCREEN Holdings Co., Ltd.
- Substrate processing apparatus and substrate processing method6 Aug 2026US 2026/0231714 A1SCREEN Holdings Co., Ltd.
- Substrate treatment device and substrate treatment method23 Jul 2026US 2026/0215200 A1SCREEN Holdings Co., Ltd.
- Substrate processing method, substrate processing apparatus, and storage medium25 Jun 2026US 2026/0177924 A1Tokyo Electron Limited
- Photoresist stripper and method for using the same18 Dec 2025US 2025/0382553 A1Nan Ya Plastics Corporation
Most cited
By later US patents
- Cleaning compositions for removing etching residue and method of using150US 5,334,332 AEKC Technology, Inc. · 1994
- Post clean treatment composition comprising an organic acid and hydroxylamine137US 5,981,454 AEKC Technology, Inc. · 1999
- Cleaning liquid for semiconductor devices124US 5,972,862 AMitsubishi Gas Chemical Company, Inc. · 1999
- Method and apparatus for removing a liquid from a surface of a rotating substrate116US 6,491,764 B2Interuniversitair Microelektronics Centrum (IMEC) · 2002
- Stripping compositions comprising hydroxylamine and alkanolamine89US 5,279,771 AEKC Technology, Inc. · 1994