Substrate treatment device and substrate treatment method

Abstract

34 Substrate treatment is performed while suppressing decrease in oxidizing power of electrolytic sulfuric acid. A substrate treatment device includes a substrate treatment unit that treats a substrate using a treatment liquid containing electrolytic sulfuric acid, a supply tank that stores the treatment liquid to be supplied to the substrate treatment unit, a temperature increasing unit that increases a temperature of the treatment liquid by mixing imparted water with the treatment liquid supplied from the supply tank in the substrate treatment unit, a generation unit that generates the treatment liquid by electrolysis and supplies the generated treatment liquid to the supply tank, and a collection unit that collects a treated liquid which is the treatment liquid used in the substrate treatment unit and supplies the treated liquid to the generation unit.

Dependencies are inferred from the claim text.