Substrate processing method, substrate processing apparatus, and storage medium

A substrate processing apparatus comprising:

• a substrate holder configured to hold a substrate;
• a fluid supply configured to supply a fluid containing pressurized pure water vapor or mist;
• a processing liquid supply configured to supply a processing liquid containing at least sulfuric acid;
• a nozzle connected to the fluid supply and the processing liquid supply, and configured to mix and discharge the fluid and the processing liquid to the substrate;
• a temperature measurer configured to measure a temperature of the processing liquid supplied from the processing liquid supply to the nozzle;
• and
• a controller configured to control operations of the substrate processing apparatus,
• wherein the controller is further configured to cause the substrate processing apparatus to perform a substrate processing method including:
• a processing liquid discharge process of supplying the processing liquid from the processing liquid supply to the nozzle and discharging the processing liquid from the nozzle to the substrate;
• and
• after the processing liquid discharge process, a mixed fluid discharge process of supplying the fluid from the fluid supply to the nozzle and discharging a mixed fluid, which is obtained by mixing the fluid and the processing liquid, from the nozzle to the substrate, when the temperature of the processing liquid measured by the temperature measurer reaches a specified temperature.

A non-transitory computer-readable storage medium storing a program for controlling operations of a substrate processing apparatus, which includes:

• a substrate holder configured to hold a substrate;
• a fluid supply configured to supply a fluid containing pressurized pure water vapor or mist;
• a processing liquid supply configured to supply a processing liquid containing at least sulfuric acid;
• a nozzle connected to the fluid supply and the processing liquid supply, and configured to mix and discharge the fluid and the processing liquid to the substrate;
• a temperature measurer configured to measure a temperature of the processing liquid supplied from the processing liquid supply to the nozzle;
• and a controller,
• wherein the controller is configured to execute the program to cause the substrate processing apparatus to perform a substrate processing method including:
• a processing liquid discharge process of supplying the processing liquid from the processing liquid supply to the nozzle and discharging the processing liquid from the nozzle to the substrate;
• and
• after the processing liquid discharge process, a mixed fluid discharge process of supplying the fluid from the fluid supply to the nozzle and discharging a mixed fluid, which is obtained by mixing the fluid and the processing liquid, from the nozzle to the substrate, when the temperature of the processing liquid measured by the temperature measurer reaches a specified temperature.