US 12,491,532 B2 · Apparatus and method for treating substrate

Abstract

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a liquid treating chamber; a support configured to support a substrate within the liquid treating chamber; a first treating liquid supply unit configured to supply a first treating liquid to the liquid treating chamber to treat the substrate with the first treating liquid; and a second treating liquid supply unit configured to supply a second treating liquid to the liquid treating chamber to treat the substrate with the second treating liquid, and wherein the second treating liquid supply unit includes a cooler for cooling the second treating liquid.

Claims13

Dependent claims

A substrate treating method comprising:

liquid treating a substrate with a first treating liquid;
and
replacing the first treating liquid on the substrate with a second treating liquid,
wherein the replacing the first treating liquid with a second treating liquid includes providing the second treating liquid at a temperature lower than a freezing point of the first treating liquid.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

18/342,797Filed 28 Jun 2023

Priority

KR 10-2022-018789128 Dec 2022

Published

US 2024/0216940 A14 Jul 2024

Granted

9 Dec 2025

Term ends

Not estimatedThe source records don’t support an estimate.

Classification19 codes

B05C 9/06
Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means…
H10P 52/00
Grinding, lapping or polishing of wafers, substrates or parts of devices
B05C 11/1042
Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material: provided with means for heating…
B05C 13/02
Means for manipulating or holding work, e.g. for separate articles: for particular articles

Apparatus and method for treating substrate

Life of this patent

Apparatus and method for treating substrate

Life of this patent

Abstract

Claims13