Stripping compositions comprising hydroxylamine and alkanolamine
AssigneeEKC Technology, Inc.
InventorWai M. Lee
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Abstract
A stripping composition for removing resists from substrates containing hydroxylamine and at least one alkanolamine is described. Optionally, one or more polar solvents can also be included in the stripping composition. The stripping composition is especially suitable for removing a photoresist from a substrate during the manufacture of semiconductor integrated circuits and for removing cured polymer coatings, such as polyimide coatings.
Claims9
A composition for the removal of a resist from a substrate, said composition consisting essentially of hydroxylamine and at least one alkanolamine which is miscible with said hydroxylamine wherein said hydroxylamine and said alkanolamine are present in sufficient amounts to remove a resist from a substrate.
Dependencies are inferred from the claim text.