Cleaning compositions for removing etching residue and method of using
AssigneeEKC Technology, Inc.
InventorWai M. Lee
Life of this patent
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Abstract
A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.
Claims8
A composition for removing etching residue from a resist-free substrate, said composition consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine and a balance of water wherein said hydroxylamine and said alkanolamine are present in sufficient amounts to remove etching residue from said resist-free substrate and said resist was removed from said substrate by means other than said composition.
A composition for removing etching residue from a substrate consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine, 5-30% of at least one chelating agent, and a balance of water wherein the hydroxylamine, said alkanolamine and said chelating agent are present in sufficient amounts to remove etching residue from a substrate.
A composition for removing etching residue from a substrate consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine, 5-30% of a chelating agent having a formula ##STR7## wherein R.dbd.OH or COOH, and a balance of water wherein the hydroxylamine, said alkanolamine, and said chelating agent are present in sufficient amounts to remove etching residue from a substrate.
A composition for removing etching residue from a substrate consisting essentially of 5-50% hydroxylamine, 10-80% of at least one alkanolamine which is miscible with said hydroxylamine, 5-30% of a chelating agent having a formula of ##STR8## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 .dbd.H or NH.sub.4, or the ammonium salt of said compound, and a balance of water wherein the hydroxylamine, said alkanolamine, and said chelating agent are present in sufficient amounts to remove etching residue from a substrate.
Dependencies are inferred from the claim text.