G03F 7/425
Containing mineral alkaline compounds
Official title: {containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen}
G03F7/425 (Containing mineral alkaline compounds) appears on 573 US grants and 633 published applications in this corpus.
Search patents in G03F- Granted patents
- 573
- Published applications
- 633
- Assignees
- 227
- Inventors
- 1,266
- Latest grant
- 7 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 4 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 1 | 0 |
| 1988 | 7 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 3 | 0 |
| 1994 | 4 | 0 |
| 1995 | 8 | 0 |
| 1996 | 13 | 0 |
| 1997 | 10 | 0 |
| 1998 | 11 | 0 |
| 1999 | 15 | 0 |
| 2000 | 16 | 0 |
| 2001 | 29 | 12 |
| 2002 | 30 | 28 |
| 2003 | 22 | 39 |
| 2004 | 18 | 53 |
| 2005 | 17 | 36 |
| 2006 | 19 | 36 |
| 2007 | 13 | 31 |
| 2008 | 13 | 28 |
| 2009 | 19 | 35 |
| 2010 | 22 | 29 |
| 2011 | 29 | 24 |
| 2012 | 17 | 18 |
| 2013 | 24 | 22 |
| 2014 | 16 | 25 |
| 2015 | 24 | 17 |
| 2016 | 18 | 28 |
| 2017 | 15 | 16 |
| 2018 | 14 | 17 |
| 2019 | 9 | 18 |
| 2020 | 25 | 22 |
| 2021 | 11 | 13 |
| 2022 | 20 | 25 |
| 2023 | 9 | 14 |
| 2024 | 11 | 19 |
| 2025 | 16 | 20 |
| 2026 | 4 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for producing a package substrate including a composition for removing the photoresist7 Jul 2026US 12,677,676 B2Mitsubishi Gas Chemical Company, Inc.
- Cleaning compositions16 Jun 2026US 12,655,367 B2Fujifilm Electronic Materials U.S.A., Inc.
- Composition for semiconductor processing and processing method10 Mar 2026US 12,570,933 B2Jsr Corporation
- Cleaning solution and method of cleaning wafer20 Jan 2026US 12,532,687 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Process solution composition for polymer treatment comprising a fluorine compound, a ketone solvent, and a polar aprotic solvent30 Dec 2025US 12,509,598 B2Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297469 A1Dongwoo Fine-Chem Co., Ltd.
- Compositions containing n-substituted piperazines for electronic manufacturing applications24 Sep 2026US 2026/0288011 A1Dow Global Technologies LLC
- Stripper composition and method of forming pattern using the same23 Jul 2026US 2026/0211334 A1Ltc Co., Ltd.
- Solvent composition16 Jul 2026US 2026/0201283 A1
- Composition for photoresist removal and method for removing photoresist16 Jul 2026US 2026/0202749 A1Mitsubishi Gas Chemical Company, Inc.
Most cited
By later US patents
- Cleaning compositions for removing etching residue and method of using150US 5,334,332 AEKC Technology, Inc. · 1994
- Method for lifting off photoresist beneath an overlayer147US 8,357,244 B1Western Digital (Fremont), LLC · 2013
- Post clean treatment composition comprising an organic acid and hydroxylamine137US 5,981,454 AEKC Technology, Inc. · 1999
- Cleaning liquid for semiconductor devices124US 5,972,862 AMitsubishi Gas Chemical Company, Inc. · 1999
- Stripping composition and method of using the same114US 4,617,251 AOlin Hunt Specialty Products Inc. · 1986