Process solution composition for polymer treatment comprising a fluorine compound, a ketone solvent, and a polar aprotic solvent
AssigneeDongwoo Fine-Chem Co., Ltd.
InventorsSoon-Hong Pang, Han-Byeol Kang, Sung-Sik Kim, Tae-Hee Kim
Life of this patent
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Abstract
The present disclosure relates to a process solution composition for polymer treatment comprising: a fluorine compound; a ketone-based solvent; and a polar aprotic solvent, wherein the ketone-based solvent is one or more selected from the group consisting of compounds represented by Chemical Formula 1 or Chemical Formula 2, and has an effect capable of preventing damage to various types of metals while improving the power of removing an adhesive polymer remaining on the wafer circuit surface in a semiconductor manufacturing process.
Claims7
A process solution composition for polymer treatment comprising:
- A) 0.1 to 30% by weight of a fluorine compound;
- B) from 5 to 90% by weight of one or more ketone-based solvent represented by the following Chemical Formula 1 or Chemical Formula 2;
- wherein R1 and R2 are each independently a C1-C18 linear or branched hydrocarbon group or a C3-C18 cycloaliphatic hydrocarbon group;
- R3 and R5 are each independently a C1-C18 linear or branched aliphatic hydrocarbon group or a C3-C18 cycloaliphatic hydrocarbon group;
- and
- R4 is a C1-C18 linear or branched divalent aliphatic hydrocarbon group;
- C) less than 4% by weight water;
- and
- D) one or more polar aprotic solvent(s) selected from the group consisting of:
- i) an amide-based solvent selected from the group consisting of N,N-dimethylformamide, N,N-diethylformamide, N,N-dipropylformamide, N,N-dimethylacetamide, N,N-diethylacetamide, N,N-dipropylacetamide, N-ethyl-N-methylacetamide, N,N-dimethylpropionamide, N,N-dimethylbutyramide, N,N-dimethylisobutyramide, N,N-dimethylpentanamide, N,N-dimethylpropanamide, N,N-diethylpropanamide, and N,N-dibutylpropanamide;
- ii) a morpholine-based solvent selected from the group consisting of N-methylmorpholine, N-ethylmorpholine, N-arylmorpholine, N-butylmorpholine, and N-isobutylmorpholine;
- iii) a pyrrolidine-based solvent selected from the group consisting of 1-ethylpyrrolidine, 1-propylpyrrolidine, 1-butylpyrrolidine, tert-butyl pyrrolidine, 1-(1-phenylpentan-2-yl) pyrrolidine, and 1-(1-cyclohexen-1-yl) pyrrolidine;
- iv) a pyrrolidone-based solvent selected from the group consisting of N-methylpyrrolidone, N-ethylpyrrolidone, and N-vinylpyrrolidone;
- v) a urea-based solvent selected from the group consisting of tetramethylurea, tetraethylurea, and tetrabutylurea;
- vi) a phosphate-based solvent selected from the group consisting of triethyl phosphate, tributyl phosphate, triamyl phosphate, and triaryl phosphate;
- vii) an oxazolidone-based solvent selected from the group consisting of 2-oxazolidone and 3-methyl-2-oxazolidone;
- and
- viii) a piperazine-based solvent selected from the group consisting of dimethylpiperazine and dibutylpiperazine, wherein other than water, the process solution composition does not comprise a compound comprising a hydroxide group.
Dependencies are inferred from the claim text.