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US 2026/0297469 A1Published application
Cleaning composition and method of forming photoresist pattern using the same
AssigneeDongwoo Fine-Chem Co., Ltd.
InventorsBAEK HYUN CHO, GI JIN KWUN, HYUNG SUB CHOI
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Abstract
A cleaning composition includes an alcohol-based solvent including a non-cyclic alcohol, and a time-lapse stabilizer including an amine compound or a cyclic alcohol. A content of the time-lapse stabilizer is greater than 0, and 1 ppb or less based on a total weight of the composition. The cleaning composition has improved time-lapse stability, and an amount of impurities may be suppressed or controlled even after long-term storage of the composition.
Claims13
A cleaning composition comprising:
- an alcohol-based solvent comprising a non-cyclic alcohol;
- and
- a time-lapse stabilizer comprising an amine compound or a cyclic alcohol,
- wherein a content of the time-lapse stabilizer is greater than 0, and 1 ppb or less based on a total weight of the composition.
1 more element
Dependencies are inferred from the claim text.