G03F 7/428
Using ultrasonic means only
Official title: {using ultrasonic means only}
G03F7/428 (Using ultrasonic means only) appears on 17 US grants and 29 published applications in this corpus.
Search patents in G03F- Granted patents
- 17
- Published applications
- 29
- Assignees
- 22
- Inventors
- 74
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 1 |
| 2002 | 0 | 2 |
| 2003 | 2 | 1 |
| 2004 | 1 | 2 |
| 2005 | 1 | 3 |
| 2006 | 0 | 1 |
| 2007 | 2 | 2 |
| 2008 | 1 | 1 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 1 |
| 2013 | 0 | 0 |
| 2014 | 1 | 1 |
| 2015 | 0 | 2 |
| 2016 | 0 | 0 |
| 2017 | 0 | 1 |
| 2018 | 0 | 1 |
| 2019 | 1 | 1 |
| 2020 | 1 | 2 |
| 2021 | 1 | 1 |
| 2022 | 0 | 2 |
| 2023 | 1 | 1 |
| 2024 | 0 | 1 |
| 2025 | 2 | 1 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Cleaning compositions16 Jun 2026US 12,655,367 B2Fujifilm Electronic Materials U.S.A., Inc.
- Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask22 Apr 2025US 12,282,260 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photoresist removal method and photoresist removal system28 Jan 2025US 12,210,288 B2Tencent Technology (Shenzhen) Company Limited
- Cleaning agent and preparation method and use thereof10 Jan 2023US 11,549,086 B2Shanghai Sinyang Semiconductor Materials Co., Ltd.
- Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask28 Dec 2021US 11,209,736 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask3 Jul 2025US 2025/0216791 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Cleaning Compositions11 Jan 2024US 2024/0010952 A1Fujifilm Electronic Materials U.S.A., Inc.
- Liquid chemical processing device2 Feb 2023US 2023/0033493 A1Toho Kasei Co., Ltd.
- Photoresist removal method and photoresist removal system6 Oct 2022US 2022/0317573 A1Tencent Technology (Shenzhen) Company Limited
- Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask14 Apr 2022US 2022/0113631 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species47US 6,848,455 B1Novellus Systems, Inc. · 2005
- Method of structuring thin layers21US 4,119,483 AU. S. Philips Corporation · 1978
- Apparatus for removing photoresist film10US 6,715,944 B2Mitsubishi Denki Kabushiki Kaisha · 2004
- Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing10US 7,169,253 B2Akrion Technologies, Inc. · 2007
- Method of removing photoresist film8US 6,517,999 B1Mitsubishi Denki Kabushiki Kaisha · 2003