Substrate treatment device and substrate treatment method
AssigneeSCREEN Holdings Co., Ltd.
InventorsMasaki Inaba, Naoko Arima, Kei Suzuki
Life of this patent
Estimating the term…
Loading patent…
AssigneeSCREEN Holdings Co., Ltd.
InventorsMasaki Inaba, Naoko Arima, Kei Suzuki
Estimating the term…
A substrate treatment apparatus includes: a substrate treatment unit that treats a substrate with a treatment liquid containing ozone dissolved therein; a recovery tank in which the treatment liquid discharged from the substrate treatment unit is recovered; a recovery pipe that connects the substrate treatment unit to the recovery tank; a heating member that heats the treatment liquid to a first temperature in at least one of the recovery pipe and the recovery tank; a supply piping system that supplies the treatment liquid from the recovery tank to the substrate treatment unit; and an ozone gas pipe that supplies ozone gas to the supply piping system to mix the ozone gas in the treatment liquid passing through the supply piping system.
A substrate treatment apparatus comprising:
Dependencies are inferred from the claim text.