Resist composition and method for forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsDaichi Takaki, Tsuyoshi Nakamura, Yusuke Itagaki
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Abstract
A resist composition comprising a base material component (A), an acid generator component (B), and a photodecomposable base (D0), in which the photodecomposable base (D0) contains a compound (D01) represented by General Formula (d0-1) and a compound (D02) represented by General Formula (d0-2), Rd01 represents a chain or cyclic aliphatic hydrocarbon group which may have a substituent, n01 represents an integer in a range of 1 to 10, Rd02 represents a cyclic aliphatic hydrocarbon group having an oxygen atom (═O), m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation
Claims6
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
- a base material component (A) which exhibits changed solubility in a developing solution under action of acid;
- an acid generator component (B) which generates acid upon exposure;
- and
- a photodecomposable base (DO) which controls diffusion of the acid generated upon exposure from the acid generator component (B),
- wherein the photodecomposable base (DO) contains a compound (D01) represented by General Formula (d0-1) and a compound (D02) represented by General Formula (d0-2),
- wherein, in General Formula (d0-1), Rd01 represents a chain or cyclic aliphatic hydrocarbon group which may have a substituent, n01 represents an integer in a range of 1 to 10, m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation;
- and in General Formula (d0-2), Rd02 represents a cyclic aliphatic hydrocarbon group having an oxygen atom (═O), m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation.
Dependencies are inferred from the claim text.