G03F 7/28
For obtaining powder images
Official title: for obtaining powder images (G03F3/10 takes precedence)
G03F7/28 (For obtaining powder images) appears on 133 US grants and 5 published applications in this corpus.
Search patents in G03F- Granted patents
- 133
- Published applications
- 5
- Assignees
- 32
- Inventors
- 141
- Latest grant
- 27 Mar 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 10 | 0 |
| 1977 | 5 | 0 |
| 1978 | 7 | 0 |
| 1979 | 1 | 0 |
| 1980 | 3 | 0 |
| 1981 | 17 | 0 |
| 1982 | 10 | 0 |
| 1983 | 5 | 0 |
| 1984 | 8 | 0 |
| 1985 | 6 | 0 |
| 1986 | 4 | 0 |
| 1987 | 5 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 5 | 0 |
| 1991 | 3 | 0 |
| 1992 | 4 | 0 |
| 1993 | 6 | 0 |
| 1994 | 7 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 4 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 0 | 0 |
| 2001 | 4 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 0 |
| 2004 | 1 | 3 |
| 2005 | 1 | 0 |
| 2006 | 0 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 1 |
| 2017 | 0 | 0 |
| 2018 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure method27 Mar 2018US 9,927,695 B2Shin-Etsu Chemical Co., Ltd.
- Lithographic apparatus and method26 Feb 2013US 8,383,325 B2ASML Netherlands B. V.
- Pattern forming method, image forming method, fine particle adsorption pattern forming method, conductive pattern forming method, pattern forming material and planographic printing plate11 Dec 2007US 7,306,895 B2FUJIFILM Corporation
- Apparatus for forming a photosensitive element having a layer of particulate material17 May 2005US 6,892,668 B2E. I. Du Pont de Nemours and Company
- Process for forming a photosensitive element having a layer of particulate material17 Aug 2004US 6,777,163 B2E. I. Du Pont de Nemours and Company
- Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure method6 Oct 2016US 2016/0291456 A1Shin-Etsu Chemical Co., Ltd.
- Lithographic apparatus and method18 Mar 2010US 2010/0068416 A1ASML Netherlands B. V.
- Pattern forming method, image forming method, fine particle adsorption pattern forming method, conductive pattern forming method, pattern forming material and planographic printing plate21 Oct 2004US 2004/0209203 A1Fuji Photo Film Co., Ltd.
- Apparatus for forming a photosensitive element having a layer of particulate material19 Aug 2004US 2004/0159404 A1E. I. Du Pont de Nemours and Company
- Process for forming a photosensitive element having a layer of particulate material and an apparatus for performing the process8 Apr 2004US 2004/0067438 A1E. I. Du Pont de Nemours and Company
Most cited
By later US patents
- Single layer dry processible photothermal-sensitive element44US 5,286,604 AE. I. Du Pont de Nemours and Company · 1994
- Process for preparing an identification card42US 4,097,279 A1978
- Use of photosensitive stratum to create through-hole connections in circuit boards42US 4,360,570 AE. I. Du Pont de Nemours and Company · 1982
- Process for image reproduction using multilayer photosensitive solvent processable elements38US 4,053,313 AE. I. Du Pont de Nemours and Company · 1977
- Negative-toning imaging system with re-imaging capability using 4-(2'-nitrophenyl)-1,4-dihydropyridine compounds32US 4,604,340 AE. I. Du Pont de Nemours and Company · 1986